Inventor
Chang Moon Lim
Inventor
Seoul, KR
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds4%
C08JWorking-up4%
H01LSemiconductor devices4%
H10BElectronic memory devices4%
H10DInorganic electric semiconductor devices4%
PatentTitleYear
9,612,524'Reflective mask and method of fabricating the same'20179,105,655'Semiconductor device and method for manufacturing the same'20158,906,584'Photomask and method for forming pattern of semiconductor device using the same'20148,841,219'Lithography processes utilizing extreme ultraviolet rays and methods of manufacturing semiconductor devices using the same'20147,915,113'Semiconductor device and method for manufacturing the same'20117,838,201'Method for manufacturing a semiconductor device'20107,629,595'Method for fabricating semiconductor device'20097,571,424'Diffused aerial image model semiconductor device fabrication'20097,553,771'Method of forming pattern of semiconductor device'20097,534,548'Polymer for immersion lithography and photoresist composition'20097,462,439'Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same'20087,419,760'Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern'20087,381,519'Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition comprising the same'20087,303,858'Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device'20077,288,364'Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same'20077,008,734'Phase shift mask'20065,770,338'Phase shifting overlay mark that measures exposure energy and focus'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Patents assigned to HYUNDAI ELECTRONICS IND (1)· patent assignee history
1998–2017Based in Seoul, KR· patent location history
2006–2011Patents assigned to HYNIX SEMICONDUCTOR INC (12)· patent assignee history
2006–2009Based in Icheon-si, KR· patent location history
2007–2008Based in Kyungki-do, KR· patent location history
2008Based in Icheon-shi, KR· patent location history
2010–2011Based in Anyang-si, KR· patent location history
2014–2017Patents assigned to SK HYNIX INC (4)· patent assignee history
2014Patents assigned to KIM SEOK KYUN (1)· patent assignee history
2014Patents assigned to LIM CHANG MOON (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HYNIX SEMICONDUCTOR INC | 12 | 2006–2011 |
| SK HYNIX INC | 4 | 2014–2017 |
| HYUNDAI ELECTRONICS IND | 1 | 1998 |
| KIM SEOK KYUN | 1 | 2014 |
| LIM CHANG MOONself | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 7 | 1998–2017 |
| Icheon-si, KR | 4 | 2006–2009 |
| Anyang-si, KR | 2 | 2010–2011 |
| Icheon-shi, KR | 2 | 2008 |
| Kyungki-do, KR | 2 | 2007–2008 |