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Inventor

Shinkichi Hashimoto

Inventor
Sagamihara, JP

Overview

3→
Patents
2000–2006
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C03Cprimary
C03CChemical composition of glasses, glazes or vitreous enamels50%
C03BManufacture, shaping, or supplementary processes33%
Y02PClimate change mitigation technologies in the production or processing of goods17%
PatentTitleYear
7,084,084'Highly durable silica glass, process for producing same, member comprised thereof, and apparatus provided therewith'20067,064,094'Highly durable silica glass, process and apparatus for producing same, and member and apparatus provided with same'20066,133,178'High purity transparent silica glass'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000Patents assigned to NIPPON SILICA GLASS (1)· patent assignee history
2000Patents assigned to TOSOH CORP (1)· patent assignee history
2000Based in Yokohama, JP· patent location history
2006Patents assigned to TOSOH SGM CORP (1)· patent assignee history
2006Patents assigned to TOSOH SMG CORP (1)· patent assignee history
2006Based in Sagamihara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NIPPON SILICA GLASS12000
TOSOH CORP12000
TOSOH SGM CORP12006
TOSOH SMG CORP12006
Locations
LocationPatentsSpan
Sagamihara, JP22006
Yokohama, JP12000