Inventor

Wei-Te Cheng

Inventor
Taipei, TW

Overview

6→
Patents
2012–2021
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices12%
G06FElectric digital data processing12%
H01LSemiconductor devices12%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein6%
G05BControl or regulating systems in general6%
G09GArrangements or circuits for control of indicating devices using static means to present variable information6%
G11CStatic stores6%
H05BElectric heating6%
H05KPrinted circuits6%
H10HInorganic light-emitting semiconductor devices having potential barriers6%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2017Patents assigned to APACER TECHNOLOGY INC (2)· patent assignee history
2012Patents assigned to CHENG WEI-TE (1)· patent assignee history
2012Patents assigned to KUNG RONG-HUA (1)· patent assignee history
2012–2021Based in Taipei, TW· patent location history
2017Based in New Taipei, TW· patent location history
2020Patents assigned to KLA TENCOR CORP (1)· patent assignee history
2020Based in Shanghai, CN· patent location history
2020Based in Taichung, TW· patent location history
2021Patents assigned to AU OPTRONICS CORP (1)· patent assignee history
2021Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APACER TECHNOLOGY INC22012–2017
AU OPTRONICS CORP12021
CHENG WEI-TEself12012
KLA TENCOR CORP12020
KUNG RONG-HUA12012
Locations
LocationPatentsSpan
Taipei, TW22012–2021
Hsinchu, TW12021
Shanghai, CN12020
Taichung, TW12020
New Taipei, TW12017