Inventor

Atsushi Yoshinouchi

Inventor
Nara, JP

Overview

27→
Patents
1988–2015
Patent span
Electricity
Primary field (CPC H)

Patents· 27 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
B23KSoldering or unsoldering9%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein9%
H04NPictorial communication, e.g. television6%
G02BOptical elements, systems or apparatus5%
G10LSpeech analysis techniques or speech synthesis3%
H01JElectric discharge tubes or discharge lamps3%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light3%
H04MTelephonic communication3%
PatentTitleYear
9,058,994'Laser annealing method and device'20158,629,522'Laser annealing method and device'20148,299,553'Laser annealing method and device'20128,115,137'Laser annealing method and laser annealing apparatus'20127,833,871'Laser annealing method and device'20107,645,677'Method for manufacturing semiconductor device'20106,890,839'Method and apparatus for laser annealing configurations of a beam'20056,835,675'Laser-irradiation method and laser-irradiation device'20046,621,636'Laser irradiation apparatus and method of laser irradiation'20036,599,790'Laser-irradiation method and laser-irradiation device'20036,492,213'Semiconductor device, thin film transistor and method for producing the same, and liquid crystal display apparatus and method for producing the same'20026,455,359'Laser-irradiation method and laser-irradiation device'20026,172,671'Active matrix type display device and fabrication method of the same'20016,130,455'Semiconductor device, thin film transistor having an active crystal layer formed by a line containing a catalyst element'20006,078,060'Active matrix display devices and methods of manufacturing the active matrix display devices'20005,966,193'LCD device having coupling capacitances and shielding films'19995,937,304'Method for fabricating semiconductor device and method for producing liquid crystal display apparatus'19995,923,961'Method of making an active matrix type display'19995,767,531'Thin-film transistor, method of fabricating the same, and liquid-crystal display apparatus'19985,504,020'Method for fabricating thin film transistor'19965,403,756'Method of producing a polycrystalline semiconductor film without annealing, for thin film transistor'19955,393,986'Ion implantation apparatus'19955,126,859'Contact type image sensor'19925,004,905'Contact type image sensor with a fiber array coated in part with an absorber'19914,942,481'Contact-type image sensor'19904,939,591'Contact-type image sensor'19904,759,951'Heat-treating Cd-containing photoelectric conversion film in the presence of a cadmium halide'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988–2002Patents assigned to SHARP KK (17)· patent assignee history
1988–2004Based in Nara, JP· patent location history
1991–1992Based in Kitakatsuragi-gun, JP· patent location history
1995–2002Based in Kashiba, JP· patent location history
1999–2015Patents assigned to SEMICONDUCTOR ENERGY LAB (13)· patent assignee history
2003–2010Patents assigned to ISHIKAWAJIMA HARIMA HEAVY IND (3)· patent assignee history
2003–2005Based in Chiba, JP· patent location history
2010–2015Based in Tokyo, JP· patent location history
2012–2014Patents assigned to KAWAGUCHI NORIHITO (3)· patent assignee history
2012–2014Patents assigned to KAWAKAMI RYUSUKE (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SHARP KK171988–2002
SEMICONDUCTOR ENERGY LAB131999–2015
ISHIKAWAJIMA HARIMA HEAVY IND32003–2010
KAWAGUCHI NORIHITO32012–2014
KAWAKAMI RYUSUKE32012–2014
Locations
LocationPatentsSpan
Nara, JP81988–2004
Tokyo, JP62010–2015
Kashiba, JP61995–2002
Chiba, JP22003–2005
Kitakatsuragi-gun, JP21991–1992