Inventor

Sheng Chu

Inventor
Hubei, CN

Overview

3→
Patents
2008–2019
Patent span
Performing operations
Primary field (CPC B)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures22%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering11%
C23CCoating metallic material11%
C25DProcesses for the electrolytic or electrophoretic production of coatings11%
G02BOptical elements, systems or apparatus11%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein11%
G06FElectric digital data processing11%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008Patents assigned to NOVATEK MICROELECTRONICS CORP (1)· patent assignee history
2008Based in Taipei, TW· patent location history
2012Patents assigned to CHU SHENG (1)· patent assignee history
2012Patents assigned to LIU JIANLIN (1)· patent assignee history
2012Patents assigned to UNIV CALIFORNIA (1)· patent assignee history
2012Based in Riverside, CA, US· patent location history
2019Patents assigned to UNIV WUHAN (1)· patent assignee history
2019Based in Hubei, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHU SHENGself12012
LIU JIANLIN12012
NOVATEK MICROELECTRONICS CORP12008
UNIV CALIFORNIA12012
UNIV WUHAN12019
Locations
LocationPatentsSpan
Hubei, CN12019
Riverside, California, US12012
Taipei, TW12008