LexDanaLexDanabeta
Inventor

Koji Mishima

Inventor
Tokyo, JP

Overview

83→
Patents
2000–2021
Patent span
Physics
Primary field (CPC G)

Patents· 83 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer35%
C25DProcesses for the electrolytic or electrophoretic production of coatings13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1010%
Y10TTechnical subjects covered by former us classification8%
C23CCoating metallic material6%
H05KPrinted circuits3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
B24BMachines, devices, or processes for grinding or polishing2%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein1%
PatentTitleYear
10,989,966Transparent semiconductor, light control body, and electronic device202110,877,345Light control film and vehicle body panel including the same20208,588,045'Information recording method and information recording apparatus'20138,409,686'Optical recording medium and method for manufacturing the same'20138,355,308'Optical recording medium and recording and reading method of optical recording medium'20138,238,214'Optical recording medium and method for reproducing the same'20128,233,374'Multilayer optical disc'20128,206,805'Optical recording medium, and method for producing optical recording medium'20128,164,989'Information recording method and information recording apparatus'20128,144,561'Multilayer optical recording medium'20128,107,349'Optical head device and optical recording and reading system'20128,081,548'Method of evaluating characteristics of multilayer optical recording medium'20117,952,984'Optical recording medium and method of recording and reproducing of optical recording medium'20117,940,634'Multilayer optical recording medium and recording method on multilayer optical recording medium'20117,932,015'Optical recording medium'20117,929,390'Optical recording method on multilayer optical recording medium and optical recording apparatus'20117,876,664'Optical recording medium'20117,852,721'Method for setting recording power, multilayer optical recording medium, and method for recording information'20107,826,333'Optical recording medium'20107,817,526'Optical recording medium'20107,787,334'Optical recording method on multilayer optical recording medium, optical recording apparatus, and multilayer optical recording medium'20107,736,474'Plating apparatus and plating method'20107,697,407'Multilayer optical recording medium and method for recording information in multilayer optical recording medium'20107,675,838'Optical recording medium'20107,639,593'Multi-layer optical recording medium and method for evaluating optical recording system'20097,592,058'Optical recording medium'20097,532,554'Method for recording information on optical recording medium and information recording apparatus'20097,517,574'Optical recording medium and method for manufacturing the same'20097,507,457'Optical recording medium and method of manufacturing the same'20097,502,295'Method for recording information on optical recording medium and information recording apparatus'20097,479,213'Plating method and plating apparatus'20097,479,363'Optical recording medium and method for optically recording data in the same'20097,447,139'Light-receiving element, optical head, optical recording/reproducing apparatus, and method of optical recording and reproduction'20087,399,511'Optical recording medium'20087,387,717'Method of performing electrolytic treatment on a conductive layer of a substrate'20087,385,911'Optical recording medium having multiple layers of different thermal conductivities'20087,385,893'Method for forming marks on write-once medium than applying second beam with power level lower than read power set for a predetermined time'20087,374,646'Electrolytic processing apparatus and substrate processing method'20087,366,081'Information recording medium'20087,357,970'Optical recording medium'20087,336,592'Optical information recording medium'20087,332,198'Plating apparatus and plating method'20087,324,426'Optical information recording medium'20087,321,543'Optical information recording medium'20087,321,481'Optical recording medium'20087,311,809'Plating apparatus for substrate'20077,276,274'Optical recording medium and method for recording and reproducing data'20077,236,440'Optical recording medium'20077,231,649'Optical recording medium and method for optically recording data in the same'20077,223,690'Substrate processing method'20077,208,074'Substrate processing apparatus and substrate plating apparatus'20077,202,161'Substrate processing method and apparatus'20077,182,990'Optical information recording medium'20077,169,705'Plating method and plating apparatus'20077,167,440'Optical information recording medium'20077,166,204'Plating apparatus and method'20077,166,347'Optical information recording medium'20077,160,597'Optical information recording medium'20077,157,128'Optical information recording medium'20077,154,836'Optical recording/reproducing method and optical recording medium'20067,141,289'Optical information recording medium'20067,143,426'Multilayer optical recording medium with thickness ranges reducing interlayer cross-talk'20067,141,288'Optical information recording medium'20067,141,274'Substrate processing apparatus and method'20067,136,343'Optical recording/reproducing method and optical recording medium'20067,033,463'Substrate plating method and apparatus'20067,018,694'Optical recording medium, method for manufacturing the same and target used for sputtering process'20066,996,055'Optical recording medium and method for optically recording data in the same'20066,982,111'Optical recording medium and recording method for optical recording medium'20066,929,840'Optical recording medium, method for manufacturing the same and target used for sputtering process'20056,858,084'Plating apparatus and method'20056,828,225'Substrate processing method'20046,793,794'Substrate plating apparatus and method'20046,790,763'Substrate processing method'20046,767,437'Electroplating apparatus and electroplating method'20046,746,589'Plating method and plating apparatus'20046,716,330'Electroless plating apparatus and method'20046,689,257'Substrate processing apparatus and substrate plating apparatus'20046,638,411'Method and apparatus for plating substrate with copper'20036,632,335'Plating apparatus'20036,517,689'Plating device'20036,365,017'Substrate plating device'20026,077,424'Method for aerobically treating wastewater and a treatment tank for such method'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2010Patents assigned to EBARA CORP (26)· patent assignee history
2000–2008Based in Kanagawa, JP· patent location history
2002–2021Based in Tokyo, JP· patent location history
2003–2008Patents assigned to TOSHIBA KK (5)· patent assignee history
2003–2007Based in Fujisawa, JP· patent location history
2006–2021Patents assigned to TDK CORP (55)· patent assignee history
2007–2010Based in Chuo-ku, JP· patent location history
2011–2013Patents assigned to MISHIMA KOJI (10)· patent assignee history
2011–2013Patents assigned to KIKUKAWA TAKASHI (9)· patent assignee history
2012Based in Nagano, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TDK CORP552006–2021
EBARA CORP262000–2010
MISHIMA KOJIself102011–2013
KIKUKAWA TAKASHI92011–2013
TOSHIBA KK52003–2008
Locations
LocationPatentsSpan
Tokyo, JP662002–2021
Fujisawa, JP72003–2007
Chuo-ku, JP62007–2010
Kanagawa, JP32000–2008
Nagano, JP12012