Inventor
David T. Hodul
Inventor
Oakland, CA, US
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1022%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light11%
PatentTitleYear
6,030,666'Method for microwave plasma substrate heating'20005,913,140'Method for reduction of plasma charging damage during chemical vapor deposition'19995,869,149'Method for preparing nitrogen surface treated fluorine doped silicon dioxide films'19995,203,631'Narrow spectral band pyrometry'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993Patents assigned to VARIAN ASSOCIATES (1)· patent assignee history
1993–2000Based in Oakland, CA, US· patent location history
1999–2000Patents assigned to LAM RES CORP (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LAM RES CORP | 3 | 1999–2000 |
| VARIAN ASSOCIATES | 1 | 1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| Oakland, California, US | 4 | 1993–2000 |