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Inventor

Doh Hoon Kim

Inventor
Seoul, KR

Overview

6→
Patents
2000–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G02BOptical elements, systems or apparatus15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
B23KSoldering or unsoldering10%
C23CCoating metallic material10%
H01LSemiconductor devices10%
H10KOrganic electric solid-state devices10%
H10DInorganic electric semiconductor devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
PatentTitleYear
10,680,177Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby202010,428,415Method of manufacturing shadow mask using hybrid processing and shadow mask manufactured thereby20196,635,404'Structure and process method of gamma gate for HEMT'20036,542,317'Optical system for crystallization tool'20036,101,047'Catadioptric optical system for lithography'20006,057,970'Apparatus for enhancing depth of focus using birefringent material'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2003Patents assigned to KOREA ELECTRONICS TELECOMM (4)· patent assignee history
2000Based in Daejeon, KR· patent location history
2003Based in Taejon, KR· patent location history
2019–2020Patents assigned to AP SYSTEMS INC (2)· patent assignee history
2019–2020Based in Seoul, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KOREA ELECTRONICS TELECOMM42000–2003
AP SYSTEMS INC22019–2020
Locations
LocationPatentsSpan
Seoul, KR22019–2020
Taejon, KR22003
Daejeon, KR22000