Inventor
Radhika Srinivasan
Inventor
Mahwah, NJ, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Bprimary
H10BElectronic memory devices38%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1025%
H10DInorganic electric semiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
G01RMeasuring electric variables4%
PatentTitleYear
11,067,635Battery cell evaluation system20216,797,582'Vertical thermal nitride mask (anti-collar) and processing thereof'20046,348,394'Method and device for array threshold voltage control by trapped charge in trench isolation'20026,333,531'Dopant control of semiconductor devices'20016,190,955'Fabrication of trench capacitors using disposable hard mask'20016,153,474'Method of controllably forming a LOCOS oxide layer over a portion of a vertically extending sidewall of a trench extending into a semiconductor substrate'20006,140,208'Shallow trench isolation (STI) with bilayer of oxide-nitride for VLSI applications'20006,130,145'Insitu doped metal policide'20006,074,903'Method for forming electrical isolation for semiconductor devices'20005,923,971'Reliable low resistance strap for trench storage DRAM cell using selective epitaxy'19995,893,735'Three-dimensional device layout with sub-groundrule features'19995,844,266'Buried strap formation in a DRAM trench capacitor'19985,827,765'Buried-strap formation in a dram trench capacitor'19985,792,685'Three-dimensional device layout having a trench capacitor'19985,656,535'Storage node process for deep trench-based DRAM'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997–2004Patents assigned to IBM (13)· patent assignee history
1997–2000Patents assigned to SIEMENS AG (7)· patent assignee history
1997Based in Wappingers Falls, NY, US· patent location history
1998–1999Based in Ramsey, NJ, US· patent location history
1998Based in Wappinger Falls, NY, US· patent location history
2000–2001Patents assigned to INFINEON TECHNOLOGIES CORP (2)· patent assignee history
2000–2001Patents assigned to TOSHIBA KK (2)· patent assignee history
2000–2004Based in Mahwah, NJ, US· patent location history
2021Patents assigned to UNIV JOHNS HOPKINS (1)· patent assignee history
2021Based in Ellicott City, MD, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 13 | 1997–2004 |
| SIEMENS AG | 7 | 1997–2000 |
| INFINEON TECHNOLOGIES CORP | 2 | 2000–2001 |
| TOSHIBA KK | 2 | 2000–2001 |
| UNIV JOHNS HOPKINS | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mahwah, New Jersey, US | 8 | 2000–2004 |
| Ramsey, New Jersey, US | 3 | 1998–1999 |
| Wappinger Falls, New York, US | 2 | 1998 |
| Ellicott City, Maryland, US | 1 | 2021 |
| Wappingers Falls, New York, US | 1 | 1997 |