Inventor

Richard Hopla

Inventor
Cranston, RI, US

Overview

10→
Patents
2005–2008
Patent span
Chemistry
Primary field (CPC C)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices36%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds14%
C08LCompositions of macromolecular compounds11%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
Y10TTechnical subjects covered by former us classification7%
C07CAcyclic or carbocyclic compounds4%
C11DDetergent compositions4%
G03CPhotosensitive materials for photographic purposes4%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2008Patents assigned to ARCH SPEC CHEM INC (7)· patent assignee history
2005–2008Based in Cranston, RI, US· patent location history
2007–2008Patents assigned to FUJIFILM ELECTRONIC MATERIALS (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ARCH SPEC CHEM INC72005–2008
FUJIFILM ELECTRONIC MATERIALS32007–2008
Locations
LocationPatentsSpan
Cranston, RI, US102005–2008