Inventor
Douglas P. Nadeau
Inventor
Underhill, VT, US
Overview
Patents· 13 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1032%
B08BCleaning in general25%
B24BMachines, devices, or processes for grinding or polishing25%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G06FElectric digital data processing4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
7,480,888'Design structure for facilitating engineering changes in integrated circuits'20096,647,579'Brush pressure control system for chemical and mechanical treatment of semiconductor surfaces'20036,432,823'Off-concentric polishing system design'20026,300,246'Method for chemical mechanical polishing of semiconductor wafer'20016,287,178'Wafer carrier rinsing mechanism'20016,273,797'In-situ automated CMP wedge conditioner'20016,247,368'CMP wet application wafer sensor'20015,974,868'Downstream monitor for CMP brush cleaners'19995,913,713'CMP polishing pad backside modifications for advantageous polishing results'19995,894,622'Brush conditioner wing'19995,834,642'Downstream monitor for CMP brush cleaners'19985,778,481'Silicon wafer cleaning and polishing pads'19985,704,987'Process for removing residue from a semiconductor wafer after chemical-mechanical polishing'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2009Patents assigned to IBM (13)· patent assignee history
1998–2009Based in Underhill, VT, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 13 | 1998–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Underhill, VT, US | 13 | 1998–2009 |