Inventor
Sunhwa Kim
Inventor
Daejeon, KR
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C08LCompositions of macromolecular compounds11%
C08JWorking-up8%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium6%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds6%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy6%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution6%
Y02PClimate change mitigation technologies in the production or processing of goods6%
C04BLime, magnesia3%
PatentTitleYear
10,875,814Core-shell particles, polymer electrolyte membrane comprising same, fuel cell or electrochemical cell comprising polymer electrolyte membrane, and method for manufacturing core-shell particles202010,811,634Light emitting display panel and electronic device including the same202010,790,528Polymer electrolyte membrane production method, polymer electrolyte membrane produced using same, membrane electrode assembly comprising said polymer electrolyte membrane, and fuel cell comprising said membrane electrode assembly20208,999,626'Polymer compound comprising dye and curable resin composition comprising same'20158,883,398'Photoactive compound and light-sensitive resin composition comprising same'20148,871,430'Photoactive compound and photosensitive resin composition comprising the same'20148,829,068'Polymer and photosensitive resin composition comprising the same'20148,791,169'Fluorene-based resin polymer and photo-sensitive resin composition comprising the same'20148,691,492'Silane-based compounds and photosensitive resin composition comprising the same'20148,633,260'Polymer compound comprising dye and curable resin composition comprising same'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2020Patents assigned to LG CHEMICAL LTD (9)· patent assignee history
2014–2015Patents assigned to KIM SUNHWA (6)· patent assignee history
2014Patents assigned to CHO CHANGHO (4)· patent assignee history
2014Patents assigned to CHUNG WON JIN (4)· patent assignee history
2014Patents assigned to HEO YOON HEE (4)· patent assignee history
2014–2020Based in Daejeon, KR· patent location history
2020Based in Hwaseong-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| LG CHEMICAL LTD | 9 | 2014–2020 |
| KIM SUNHWAself | 6 | 2014–2015 |
| CHO CHANGHO | 4 | 2014 |
| CHUNG WON JIN | 4 | 2014 |
| HEO YOON HEE | 4 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Daejeon, KR | 9 | 2014–2020 |
| Hwaseong-si, KR | 1 | 2020 |