Inventor

Harbans S. Sachdev

Inventor

Wappingers Falls, NY, US

Overview

28→

Patents

1981–2010

Patent span

Physics

Primary field (CPC G)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices30%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests12%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds11%

H05KPrinted circuits5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%

C09KMaterials for miscellaneous applications, not provided for elsewhere4%

Y10TTechnical subjects covered by former us classification4%

B05DProcesses for applying fluent materials to surfaces, in general2%

PatentTitleYear

7,670,961'Reduction of cracking in low-k spin-on dielectric films'2010 6,635,118'Aqueous cleaning of polymer apply equipment'2003 6,153,696'Process for forming carbonates of hydroxyaromatic compounds'2000 5,976,710'Low TCE polyimides as improved insulator in multilayer interconnect structures'1999 5,422,223'Silicon-containing positive resist and use in multilayer metal structures'1995 5,399,462'Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane'1995 5,385,804'Silicon containing negative resist for DUV, I-line or E-beam lithography comprising an aromatic azide side group in the polysilsesquioxane polymer'1995 5,338,818'Silicon containing positive resist for DUV lithography'1994 5,322,765'Dry developable photoresist compositions and method for use thereof'1994 5,312,717'Residue free vertical pattern transfer with top surface imaging resists'1994 5,296,332'Crosslinkable aqueous developable photoresist compositions and method for use thereof'1994 5,240,812'Top coat for acid catalyzed resists'1993 5,213,704'Process for making a compliant thermally conductive compound'1993 5,115,090'Viscosity stable, essentially gel-free polyamic acid compositions'1992 5,114,826'Photosensitive polyimide compositions'1992 5,094,769'Compliant thermally conductive compound'1992 4,978,594'Fluorine-containing base layer for multi-layer resist processes'1990 4,826,564'Method of selective reactive ion etching of substrates'1989 4,772,346'Method of bonding inorganic particulate material'1988 4,692,205'Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings'1987 4,665,006'Positive resist system having high resistance to oxygen reactive ion etching'1987 4,599,243'Use of plasma polymerized organosilicon films in fabrication of lift-off masks'1986 4,562,091'Use of plasma polymerized orgaosilicon films in fabrication of lift-off masks'1985 4,525,722'Chemical heat amplification in thermal transfer printing'1985 4,519,872'Use of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processes'1985 4,493,855'Use of plasma polymerized organosilicon films in fabrication of lift-off masks'1985 4,371,565'Process for adhering an organic resin to a substrate by means of plasma polymerized phosphines'1983 4,286,989'Formulations for ink jet printing'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981–2003Patents assigned to IBM (26)· patent assignee history

1981–1993Based in Wappingers Falls, NY, US· patent location history

1990Based in Wappinger Falls, NY, US· patent location history

1992Patents assigned to HUMMEL JOHN P (1)· patent assignee history

1992Patents assigned to KWONG RANEE W (1)· patent assignee history

1992Patents assigned to LANG ROBERT N (1)· patent assignee history

1992Patents assigned to LINEHAN LEO L (1)· patent assignee history

1993–2010Based in Hopewell Junction, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
IBM	26	1981–2003
HUMMEL JOHN P	1	1992
KWONG RANEE W	1	1992
LANG ROBERT N	1	1992
LINEHAN LEO L	1	1992

Locations

Location	Patents	Span
Wappingers Falls, New York, US	15	1981–1993
Hopewell Junction, New York, US	12	1993–2010
Wappinger Falls, New York, US	1	1990