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Inventor

Linda M. Ephrath

Inventor
Danbury, CT, US

Overview

4→
Patents
1981–1987
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
H01JElectric discharge tubes or discharge lamps25%
C23FNon-mechanical removal of metallic material from surface13%
G01NInvestigating or analysing materials by determining their chemical or physical properties13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
PatentTitleYear
4,675,072'Trench etch endpoint detection by LIF'19874,473,598'Method of filling trenches with silicon and structures'19844,426,274'Reactive ion etching apparatus with interlaced perforated anode'19844,283,249'Reactive ion etching'1981

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1981–1987Patents assigned to IBM (4)· patent assignee history
1981–1984Based in Danbury, CT, US· patent location history
1987Based in LaGrange, NY, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IBM41981–1987
Locations
LocationPatentsSpan
Danbury, CT, US31981–1984
LaGrange, New York, US11987