Inventor

LI-TE LIN

Inventor

TW

Overview

2021–2026

Patent span

Electricity

Primary field (CPC H)

Patents· 81 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary

H01LSemiconductor devices28%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%

H10DInorganic electric semiconductor devices23%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%

B82YSpecific uses or applications of nanostructures7%

H01JElectric discharge tubes or discharge lamps3%

B23KSoldering or unsoldering1%

C23CCoating metallic material1%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests0%

PatentTitleYear

12,598,937Epitaxial formation with treatment and semiconductor devices resulting therefrom2026 12,575,156Reducing pattern loading in the etch-back of metal gate2026 12,520,558High selectivity etching with germanium-containing gases2026 12,513,952Method for fabricating a semiconductor device including etching nanostructures2025 12,501,670Isolation structure for semiconductor device2025 12,471,344Dry etching of semiconductor structures with fluorine-containing gases2025 12,396,205Semiconductor device having fins and method of fabricating the same2025 12,396,245Semiconductor arrangement and method for making2025 12,389,619Semiconductor device structure with inner spacer layer2025 12,376,337Air inner spacers2025 12,356,646Semiconductor device and method for manufacturing the same2025 12,336,252Inner spacer formation in multi-gate transistors2025 12,334,342Pattern fidelity enhancement2025 12,310,043Method of fabricating a semiconductor device2025 12,310,097Dielectric protection layer in middle-of-line interconnect structure manufacturing method2025 12,288,722Spacer structure for semiconductor device and method for forming the same2025 12,261,085Semiconductor device with reduced loading effect2025 12,255,074Selective etching method and semiconductor structure manufactured using the same2025 12,230,507Method of manufacturing semiconductor devices using directional process2025 12,224,210Method for FinFet fabrication and structure thereof2025 12,217,961Hard mask trimming in method for manufacturing semiconductor device2025 12,218,219Spacer structure for semiconductor device2025 12,198,939Technique for semiconductor manufacturing2025 12,183,805Semiconductor device and manufacturing method thereof2024 12,154,969Semiconductor device structure with metal gate stack2024 12,154,970Method for semiconductor device structure2024 12,125,897Air spacers in transistors and methods forming same2024 12,094,951Capping structures in semiconductor devices2024 12,087,558Ion beam etching apparatus and method2024 12,046,676Semiconductor devices and methods of manufacturing thereof2024 12,033,863Semiconductor fabrication system embedded with effective baking module2024 12,034,059Reducing pattern loading in the etch-back of metal gate2024 12,027,625Semiconductor device having fins and method of fabricating the same2024 12,021,125High selectivity etching with germanium-containing gases2024 12,014,954Method and equipment for forming gaps in a material layer2024 12,002,663Processing apparatus and method for forming semiconductor structure2024 11,978,672Semiconductor device with elongated pattern2024 11,973,129Semiconductor device structure with inner spacer layer and method for forming the same2024 11,942,372Dielectric protection layer in middle-of-line interconnect structure manufacturing method2024 11,942,367Semiconductor device and method of manufacture2024 11,929,424Semiconductor device and method for forming the same2024 11,908,701Patterning method and manufacturing method of semiconductor device2024 11,908,685Methods of reducing gate spacer loss during semiconductor manufacturing2024 11,901,190Method of patterning2024 11,881,401Method of forming metal features2024 11,862,465Fine line patterning methods2024 11,855,192Semiconductor device and manufacturing method thereof2023 11,843,041Gate etch back with reduced loading effect2023 11,830,928Inner spacer formation in multi-gate transistors2023 11,791,161Pattern fidelity enhancement2023 11,776,850Semiconductor device with reduced loading effect2023 11,769,822Semiconductor device and method for manufacturing the same2023 11,728,221Air spacers in transistors and methods forming same2023 11,707,803Apparatus and method for directional etch with micron zone beam and angle control2023 11,652,152Capping structures in semiconductor devices2023 11,651,972Method of manufacturing semiconductor devices using directional process2023 11,646,234Method for FinFET fabrication and structure thereof2023 11,626,506Reducing pattern loading in the etch-back of metal gate2023 11,605,728Semiconductor device structure with inner spacer layer2023 11,581,222Via in semiconductor device structure2023 11,551,966Method of forming semiconductor structure having layer with re-entrant profile2023 11,545,397Spacer structure for semiconductor device and method for forming the same2023 11,522,065Gate etch back with reduced loading effect2022 11,515,423Semiconductor device having fins2022 11,469,143Semiconductor device with elongated pattern2022 11,424,341Semiconductor device2022 11,417,751Semiconductor device structure and method for forming the same2022 11,373,878Technique for semiconductor manufacturing2022 11,351,635Apparatus and method for directional etch with micron zone beam and angle control2022 11,264,281Semiconductor device with reduced loading effect2022 11,244,856Method and equipment for forming gaps in a material layer2022 11,239,078Fine line patterning methods2022 11,222,794Semiconductor fabrication system embedded with effective baking module2022 11,217,487Semiconductor arrangement and method of manufacture2022 11,205,700Air gap spacer and related methods2021 11,201,243Nanowire stack GAA device and methods for producing the same2021 11,201,229Structure and formation method of semiconductor device with metal gate stack2021 11,195,759Semiconductor arrangement and method for making2021 11,183,580Structure and formation method of semiconductor device with metal gate stack2021 11,152,491Method for forming semiconductor device structure with inner spacer layer2021 11,145,749Method of fabricating a semiconductor device2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (81)· patent assignee history

2021–2026Based in TW· patent location history

2023Patents assigned to TSMC NANJING COMPANY LTD (1)· patent assignee history

2025Patents assigned to TAIWAN SEMICONDUCOR MFG COMPANY LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	81	2021–2026
TAIWAN SEMICONDUCOR MFG COMPANY LTD	1	2025
TSMC NANJING COMPANY LTD	1	2023

Locations

Location	Patents	Span
TW	81	2021–2026