Inventor
Minoru Danno
Inventor
Yokohama, JP
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps9%
B01DSeparation8%
G02BOptical elements, systems or apparatus7%
H05HPlasma technique7%
A62DChemical means for extinguishing fires or for combating or protecting against harmful chemical agents6%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry6%
B08BCleaning in general6%
C01BNon-metallic elements6%
H05BElectric heating6%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]6%
PatentTitleYear
11,117,221Laser machining device and laser machining method202110,792,759Laser processing method and laser processing apparatus202010,162,187High-output optical attenuator, measurement device, and 3D shaping apparatus20189,862,055'Processing apparatus and processing method'20189,243,939'Flow volume measurement device and flow velocity measurement device'20169,051,863'Flue gas purifying device'20158,950,356'Barrier-film forming apparatus, barrier-film forming method, and barrier-film coated container'20158,607,547'Flue gas purifying device'20138,418,650'Inner electrode for barrier film formation and apparatus for film formation'20138,237,926'Method and apparatus for measuring density'20128,034,177'Inner electrode for barrier film formation and apparatus for film formation'20117,936,460'Sensor unit in exhaust gas analyzer'20117,813,036'Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus'20107,733,563'Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus'20107,453,630'Optical properties apparatus, the restoration method, and an optical system used in the apparatus'20087,440,206'Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus'20087,190,512'Optical properties restoration apparatus, the restoration method, and an optical system used in the apparatus'20077,064,323'Chemical substance detection apparatus and chemical substance detection method'20066,650,059'Method of decomposing organic halide'20036,635,997'Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide'20036,600,084'Method of decomposing organic halide'20036,593,507'Method of decomposing organic halide'20036,417,079'Discharge electrode, high-frequency plasma generator, method of power feeding, and method of manufacturing semiconductor device'20026,340,863'Microwave plasma generator and system for decomposing organic halide'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2021Patents assigned to MITSUBISHI HEAVY IND LTD (19)· patent assignee history
2002–2018Based in Yokohama, JP· patent location history
2002–2015Based in Kanagawa, JP· patent location history
2012–2016Patents assigned to DANNO MINORU (6)· patent assignee history
2012–2016Patents assigned to MUTA KENJI (4)· patent assignee history
2012–2016Patents assigned to TANOURA MASAZUMI (4)· patent assignee history
2013–2016Patents assigned to AOKI TADASHI (3)· patent assignee history
2015Based in Kanawaga, JP· patent location history
2016–2021Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI HEAVY IND LTD | 19 | 2002–2021 |
| DANNO MINORUself | 6 | 2012–2016 |
| MUTA KENJI | 4 | 2012–2016 |
| TANOURA MASAZUMI | 4 | 2012–2016 |
| AOKI TADASHI | 3 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 12 | 2002–2018 |
| Kanagawa, JP | 7 | 2002–2015 |
| Tokyo, JP | 4 | 2016–2021 |
| Kanawaga, JP | 1 | 2015 |