LexDanaLexDanabeta
Inventor

Kuei-Yen Wu

Inventor
Hsinchu, TW

Overview

2→
Patents
2002–2003
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B82Yprimary
B82YSpecific uses or applications of nanostructures25%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G11BInformation storage based on relative movement between record carrier and transducer25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests25%
PatentTitleYear
6,506,543'Method of photolithography using super-resolution near-field structure'20036,404,722'Method of increasing recording density and capacity of a compact disc'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2003Patents assigned to RITEK CORP (2)· patent assignee history
2002–2003Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
RITEK CORP22002–2003
Locations
LocationPatentsSpan
Hsinchu, TW22002–2003