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Inventor

Philip Grunow

Inventor
Livermore, CA, US

Overview

3→
Patents
2004–2010
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%
B08BCleaning in general18%
H01JElectric discharge tubes or discharge lamps18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
B82YSpecific uses or applications of nanostructures9%
G21KHandling of particles or ionising radiation not otherwise provided for9%
PatentTitleYear
7,740,916'Method for the protection of extreme ultraviolet lithography optics'20107,147,722'Method for in-situ cleaning of carbon contaminated surfaces'20066,772,776'Apparatus for in situ cleaning of carbon contaminated surfaces'2004

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2010Patents assigned to EUV LLC (3)· patent assignee history
2004–2006Based in Livermore, CA, US· patent location history
2010Based in San Leandro, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EUV LLC32004–2010
Locations
LocationPatentsSpan
Livermore, California, US22004–2006
San Leandro, California, US12010