Inventor
Shigeyuki Uzawa
Inventor
Tokyo, JP
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices73%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G02BOptical elements, systems or apparatus5%
F16FSprings3%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them3%
G05BControl or regulating systems in general3%
G21KHandling of particles or ionising radiation not otherwise provided for3%
H01JElectric discharge tubes or discharge lamps3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
PatentTitleYear
7,948,695'Optical element positioning apparatus, projection optical system and exposure apparatus'20117,821,726'Optical element positioning apparatus, projection optical system and exposure apparatus'20107,525,106'Exposure apparatus, pressure control method for the same, and device manufacturing method'20097,166,855'Surface position detecting system and method'20076,963,075'Scanning exposure apparatus and device manufacturing method'20056,864,953'Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatus'20056,614,503'Projection exposure apparatus, and device manufacturing method which compensate for a change in optical performance of a projection optical system'20036,559,465'Surface position detecting method having a detection timing determination'20036,534,777'Surface position detecting system and method having a sensor selection'20036,531,706'Surface position detecting system and method having an optimum value'20036,493,062'Driving apparatus and exposure apparatus'20026,473,158'Exposure method and exposure apparatus'20026,359,688'Projection exposure apparatus and method of controlling same'20026,342,703'Exposure apparatus, exposure method, and device manufacturing method employing the exposure method'20026,342,942'Exposure apparatus, exposure control method, and device fabrication method using the exposure apparatus'20026,333,786'Aligning method'20016,307,620'Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding section'20016,271,910'Projection exposure apparatus and method'20016,142,660'Semiconductor manufacturing apparatus and command setting method'20006,097,495'Aligning method'20006,081,614'Surface position detecting method and scanning exposure method using the same'20005,986,766'Alignment method and alignment system'19995,920,398'Surface position detecting method and scanning exposure method using the same'19995,793,471'Projection exposure method and apparatus in which scanning exposure is performed in accordance with a shot layout of mask patterns'19985,783,341'Alignment for layer formation through determination of target values for translation, rotation and magnification'19985,751,404'Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates'19985,695,897'Alignment method and semiconductor exposure method'19975,585,925'Alignment method'19965,543,921'Aligning method utilizing reliability weighting coefficients'19965,499,099'Alignment method and alignment system'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2011Patents assigned to CANON KK (30)· patent assignee history
1996–2007Based in Tokyo, JP· patent location history
1996–2011Based in Utsunomiya, JP· patent location history
1998–2002Based in Naka-machi, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 30 | 1996–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 20 | 1996–2007 |
| Naka-machi, JP | 6 | 1998–2002 |
| Utsunomiya, JP | 4 | 1996–2011 |