Inventor
Yoshihiro Koshido
Inventor
Kanazawa, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H03Hprimary
H03HImpedance networks, e.g. resonant circuits20%
Y10TTechnical subjects covered by former us classification15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H01GCapacitors7%
H05KPrinted circuits7%
H10DInorganic electric semiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
C23FNon-mechanical removal of metallic material from surface4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
PatentTitleYear
10,032,567Solid-state electrolytic capacitor manufacturing method and solid-state electrolytic capacitor20189,552,928'Solid-state electrolytic capacitor manufacturing method and solid-state electrolytic capacitor'20179,490,076'Solid electrolytic capacitor and manufacturing method therefor'20168,780,533'Solid electrolytic capacitor and method for producing the same'20148,256,275'In-liquid-substance detection sensor'20128,104,404'Ignition element mounting capacitor, header assembly, squib and gas generator for air bag and gas generator for seat belt pretensioner'20127,316,783'Method of wiring formation and method for manufacturing electronic components'20087,259,500'Piezoelectric device'20077,102,272'Piezoelectric component and method for manufacturing the same'20067,042,056'Chip-size package piezoelectric component'20066,826,815'Method for manufacturing a surface acoustic wave device'20046,821,712'Methods of forming resist pattern, forming electrode pattern, and manufacturing surface acoustic wave device'20046,808,641'Method of wiring formation and method for manufacturing electronic components'20046,762,533'Surface acoustic wave device'20046,725,513'Method for manufacturing surface acoustic wave apparatus'20046,686,675'Electronic device and method for producing the same'20046,581,258'Method of forming electrode film'20036,369,491'Surface acoustic wave device and method for manufacturing the same'20026,358,429'Electronic device and method for producing the same'20026,340,635'Resist pattern, process for the formation of the same, and process for the formation of wiring pattern'20026,204,190'Method for producing an electronic device'20016,156,672'Method of forming dielectric thin film pattern and method of forming laminate pattern comprising dielectric thin film and conductive thin film'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2018Patents assigned to MURATA MANUFACTURING CO (21)· patent assignee history
2000–2006Based in Shiga, JP· patent location history
2002–2008Based in Kanazawa, JP· patent location history
2004–2012Based in Yasu, JP· patent location history
2004–2014Based in Kyoto, JP· patent location history
2012–2014Patents assigned to KOSHIDO YOSHIHIRO (3)· patent assignee history
2012Patents assigned to AIZAWA NAOKO (2)· patent assignee history
2012–2014Patents assigned to FUJIMOTO KOJI (2)· patent assignee history
2012Patents assigned to YAMADA HAJIME (2)· patent assignee history
2012–2018Based in Nagaokakyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MURATA MANUFACTURING CO | 21 | 2000–2018 |
| KOSHIDO YOSHIHIROself | 3 | 2012–2014 |
| AIZAWA NAOKO | 2 | 2012 |
| FUJIMOTO KOJI | 2 | 2012–2014 |
| YAMADA HAJIME | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanazawa, JP | 7 | 2002–2008 |
| Shiga, JP | 6 | 2000–2006 |
| Nagaokakyo, JP | 4 | 2012–2018 |
| Yasu, JP | 3 | 2004–2012 |
| Kyoto, JP | 2 | 2004–2014 |