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Inventor

RAJIV K. SINGH

Inventor
US

Overview

4→
Patents
2022–2025
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing20%
C09GPolishing compositions20%
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
12,435,243Polishing of transition metals202511,840,645CMP composition for polishing hard materials202311,820,918Hard abrasive particle-free polishing of hard materials202311,213,927CMP polishing pad conditioner2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2023Patents assigned to UNIV FLORIDA (3)· patent assignee history
2022Patents assigned to ENTREGIS INC (1)· patent assignee history
2022Patents assigned to SINMAT INC (1)· patent assignee history
2022–2025Based in US· patent location history
2023–2025Patents assigned to ENTEGRIS INC (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ENTEGRIS INC32023–2025
UNIV FLORIDA32022–2023
ENTREGIS INC12022
SINMAT INC12022
Locations
LocationPatentsSpan
US42022–2025