Inventor

Jeffrey S. Hale

Inventor

Lincoln, NE, US

Overview

2002–2020

Patent span

Physics

Primary field (CPC G)

Patents· 32 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary

G01NInvestigating or analysing materials by determining their chemical or physical properties42%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light28%

G02BOptical elements, systems or apparatus13%

G01BMeasuring length, thickness or similar linear dimensions7%

F16CShafts1%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices1%

G06FElectric digital data processing1%

G06GAnalogue computers1%

G06KGraphical data reading1%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h101%

PatentTitleYear

10,775,298Ellipsometer or polarimeter system having at least one rotating element which is driven by a motor comprising air bearing2020 10,338,362Beam focusing and reflecting optics with enhanced detector system2019 10,175,160Method to analyze spectroscopic ellipsometry or intensity data of porous samples utilizing the anisotropic bruggeman-effective medium theory2019 10,061,068Deviation angle self-compensating substantially achromatic retarder2018 10,018,815Beam focusing and reflective optics2018 9,976,902Method to analyze spectroscopic ellipsometry data of porous samples utilizing the anisotropic Bruggeman-effective medium theory2018 9,952,141Method of characterizing a beam of electromagnetic radiation in ellipsometer and the like systems2018 9,921,395'Beam focusing and beam collecting optics with wavelength dependent filter element adjustment of beam area'2018 9,500,843'Beam focusing and beam collecting optics'2016 9,442,016'Reflective focusing optics'2016 9,347,768'In line ellipsometer system and method of use'2016 8,436,994'Fast sample height, AOI and POI alignment in mapping ellipsometer or the like'2013 8,159,672'Sample investigating system and method of use'2012 7,872,751'Fast sample height, AOI and POI alignment in mapping ellipsometer or the like'2011 7,705,995'Method of determining substrate etch depth'2010 7,623,237'Sample investigating system'2009 7,567,345'Ellipsometer meeting scheimpflug condition with provision of an essentially circular electromagnetic radiation spot on a sample'2009 7,535,566'Beam chromatic shifting and directing means'2009 7,492,455'Discrete polarization state spectroscopic ellipsometer system and method of use'2009 7,362,435'Method of determining initial thickness value for sample surface layer, and use of splines for fitting ellipsometric data'2008 7,336,361'Spectroscopic ellipsometer and polarimeter systems'2008 7,304,737'Rotating or rotatable compensator system providing aberation corrected electromagnetic raadiation to a spot on a sample at multiple angles of a incidence'2007 7,295,313'Application of intermediate wavelength band spectroscopic ellipsometry to in-situ real time fabrication of multiple layer alternating high/low refractive index filters'2007 7,245,376'Combined spatial filter and relay systems in rotating compensator ellipsometer/polarimeter'2007 7,215,424'Broadband ellipsometer or polarimeter system including at least one multiple element lens'2007 7,193,710'Rotating or rotatable compensator spectroscopic ellipsometer system including multiple element lenses'2007 7,099,006'Ellipsometer or polarimeter and the like system with beam chromatic shifting and directing means'2006 7,075,649'Discrete polarization state rotatable compensator spectroscopic ellipsometer system, and method of calibration'2006 7,075,650'Discrete polarization state spectroscopic ellipsometer system and method of use'2006 6,940,595'Application of spectroscopic ellipsometry to in-situ real time fabrication of multiple layer alternating high/low refractive index filters'2005 6,636,309'Application of spectroscopic ellipsometry to in situ real time fabrication of multiple alternating high/low refractive index narrow bandpass optical filters'2003 6,483,586'Beam splitting analyzer means in rotating compensator ellipsometer'2002

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2002–2020Patents assigned to J A WOOLLAM CO INC (30)· patent assignee history

2002–2020Based in Lincoln, NE, US· patent location history

2012–2020Patents assigned to HALE JEFFREY S (5)· patent assignee history

2012–2018Patents assigned to LIPHARDT MARTIN M (4)· patent assignee history

2012–2020Patents assigned to HERZINGER CRAIG M (3)· patent assignee history

2013–2020Patents assigned to PFEIFFER GALEN L (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
J A WOOLLAM CO INC	30	2002–2020
HALE JEFFREY Sself	5	2012–2020
LIPHARDT MARTIN M	4	2012–2018
HERZINGER CRAIG M	3	2012–2020
PFEIFFER GALEN L	3	2013–2020

Locations

Location	Patents	Span
Lincoln, NE, US	32	2002–2020