LexDanaLexDanabeta
Inventor

Yoshinobu Kimura

Inventor
Tokyo, JP

Overview

67→
Patents
1976–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 67 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices21%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1021%
B23KSoldering or unsoldering10%
Y10TTechnical subjects covered by former us classification8%
H01JElectric discharge tubes or discharge lamps5%
C30BSingle-crystal growth4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
10,840,060Scanning electron microscope and sample observation method202010,453,648Charged particle bean device and information-processing device201910,451,687Power converter and diagnostic system thereof201910,121,634Charged particle beam device and charged particle beam measurement method20189,991,092Scanning electron microscope and sample observation method20189,846,133Semiconductor inspection device including a counter electrode with adjustable potentials used to obtain images for detection of defects, and inspection method using charged particle beam20179,659,744'Charged particle beam apparatus and inspection method using the same'20179,508,611'Semiconductor inspection method, semiconductor inspection device and manufacturing method of semiconductor element'20169,236,220'Electronic microscope, setting method of observation condition of electronic microscope, and observation method using electronic microscope'20169,202,668'Observation specimen for use in electron microscopy, electron microscopy, electron microscope, and device for producing observation specimen'20159,191,030'Memory controller, data storage device, and memory controlling method'20158,907,279'Electron microscope and image capturing method using electron beam'20148,149,095'Gateway device allowing home network appliances to be introduced and controlled over a network and a control method therefor'20128,114,217'Crystallization method, crystallization apparatus, processed substrate, thin film transistor and display apparatus'20128,034,696'Manufacturing method of semiconductor device'20117,944,024'Semiconductor device and manufacturing method of the same'20117,868,425'Semiconductor device and manufacturing method of the same'20117,859,016'Thin film semiconductor device, polycrystalline semiconductor thin film production process and production apparatus'20107,838,379'Non-volatile memory device and method of manufacturing the same'20107,812,398'Semiconductor device including a P-type field-effect transistor'20107,692,864'Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, manufacturing method of thin film transistor, and manufacturing method of matrix circuit substrate of display'20107,608,891'Thin film transistor, circuit apparatus and liquid crystal display'20097,572,335'Crystallization apparatus and crystallization method'20097,556,993'Thin film semiconductor device, polycrystalline semiconductor thin film production process and production apparatus'20097,537,660'Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, manufacturing method of thin film transistor, and manufacturing method of matrix circuit substrate of display'20097,531,853'Semiconductor device and manufacturing method of the same'20097,518,252'Thin-film semiconductor substrate, method of manufacturing thin-film semiconductor substrate, method of crystallization, apparatus for crystallization, thin-film semiconductor device, and method of manufacturing thin-film semiconductor device'20097,505,204'Crystallization apparatus, crystallization method, and phase shifter'20097,491,972'Polysilicon semiconductor thin film substrate, method for producing the same, semiconductor device, and electronic device'20097,491,264'Oxygen concentrating apparatus'20097,436,046'Semiconductor device and manufacturing method of the same'20087,413,608'Crystallization apparatus, crystallization method, and phase shifter'20087,413,604'Process for producing polysilicon film'20087,410,848'Crystallization method, crystallization apparatus, processed substrate, thin film transistor and display apparatus'20087,352,002'Semiconductor device including semiconductor thin films having different crystallinity, substrate of the same, and manufacturing method of the same, and liquid crystal display and manufacturing method of the same'20087,350,524'Liquid-applying device'20087,335,261'Apparatus for forming a semiconductor thin film'20087,227,186'Thin film transistor and method of manufacturing the same'20077,186,602'Laser annealing method'20077,172,932'Thin film semiconductor device, polycrystalline semiconductor thin film production process and production apparatus'20077,172,841'Crystallization apparatus, crystallization method, and phase shift mask'20077,118,946'Thin film transistor, circuit device and liquid crystal display'20067,115,454'Thin film semiconductor device, polycrystalline semiconductor thin film production and process and production apparatus'20067,105,419'Thin-film semiconductor substrate, method of manufacturing thin-film semiconductor substrate, method of crystallization, apparatus for crystallization, thin-film semiconductor device, and method of manufacturing thin-film semiconductor device'20067,101,436'Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, manufacturing method of thin film transistor, and manufacturing method of matrix circuit substrate of display'20067,087,505'Semiconductor device including semiconductor thin films having different crystallinity, substrate of the same, and manufacturing method of the same, and liquid crystal display and manufacturing method of the same'20067,056,626'Crystallization apparatus, crystallization method, thin film transistor and display apparatus'20067,011,709'Crystallization apparatus, optical member for use in crystallization apparatus, crystallization method, thin film transistor, and display'20067,001,461'Crystallization apparatus, crystallization method, and phase shifter'20066,987,035'Method and apparatus for forming crystallized semiconductor layer, and method for manufacturing semiconductor apparatus'20066,953,714'Thin film semiconductor device having arrayed configuration of semiconductor crystals and a method for producing it'20056,946,367'Methods for forming a semiconductor thin film'20056,903,371'Thin film transistor and display using the same'20056,870,126'Semiconductor device, annealing method, annealing apparatus and display apparatus'20056,806,099'Process for producing polycrystalline silicon film by crystallizing on amorphous silicon film by light irradiation'20046,756,614'Thin film semiconductor device, polycrystalline semiconductor thin film production process and production apparatus'20046,716,688'Irradiation of manufacturing a thin film transistor by laser irradiation'20046,670,638'Liquid crystal display element and method of manufacturing the same'20036,657,227'Transistor with thin film active region having clusters of different crystal orientation'20036,529,304'Optical communication equipment and system'20036,501,095'Thin film transistor'20026,452,213'SEMICONDUCTOR DEVICE HAVING FIRST, SECOND AND THIRD NON-CRYSTALLINE FILMS SEQUENTIALLY FORMED ON INSULATING BASE WITH SECOND FILM HAVING THERMAL CONDUCTIVITY NOT LOWER THAN THAT OF FIRST FILM AND NOT HIGHER THAN THAT OF THIRD FILM, AND METHOD OF MANUFACTURING THE SAME'20026,058,312'Automatic selecting apparatus for an optimum wireless communication route'20004,629,953'Control circuit for sliding roof devices'19864,540,252'Side-mirror driving apparatus'19854,121,355'Learning device'19783,967,483'Device for adjusting a preload and additionally compensating the slide in a press'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1985Based in Chiryu, JP· patent location history
1978–2020Based in Tokyo, JP· patent location history
1986–2012Based in Saitama, JP· patent location history
2002–2019Patents assigned to HITACHI LTD (22)· patent assignee history
2005–2010Patents assigned to ADV LCD TECH DEV CT CO LTD (19)· patent assignee history
2005–2009Patents assigned to EKISHO SENTAN GIJUTSU KAIHATSU (4)· patent assignee history
2005–2012Based in Yokohama, JP· patent location history
2012–2018Patents assigned to KIMURA YOSHINOBU (5)· patent assignee history
2014–2020Patents assigned to HITACHI HIGH TECH CORP (8)· patent assignee history
2015Based in Kanagawa, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD222002–2019
ADV LCD TECH DEV CT CO LTD192005–2010
HITACHI HIGH TECH CORP82014–2020
KIMURA YOSHINOBUself52012–2018
EKISHO SENTAN GIJUTSU KAIHATSU42005–2009
Locations
LocationPatentsSpan
Tokyo, JP401978–2020
Yokohama, JP202005–2012
Saitama, JP21986–2012
Chiryu, JP21976–1985
Kanagawa, JP12015