Inventor
Byung-Jin Choi
Inventor
Austin, TX, US
Overview
Patents· 170 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
B82YSpecific uses or applications of nanostructures21%
B29CShaping or joining of plastics13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
G06FElectric digital data processing3%
Y10TTechnical subjects covered by former us classification3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein2%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them1%
PatentTitleYear
10,866,510Overlay improvement in nanoimprint lithography202010,795,511Touch sensor and touch screen panel having a bending portion202010,770,518OLED-integrated touch sensor and OLED display device including the same202010,741,847Method and apparatus for selecting a reactant for removing a residual lithium compound from a cathode material202010,718,054Nano imprinting with reusable polymer template with metallic or oxide coating202010,712,660Template for imprint lithography including a recession and an apparatus and method of using the template202010,654,216System and methods for nanoimprint lithography202010,635,247Touch sensor202010,627,715Method for separating a nanoimprint template from a substrate202010,606,383Touch sensor comprising mesh pattern202010,586,980Composite cathode active material, method of preparing the composite cathode active material, and cathode and lithium battery each including the composite cathode active material202010,578,984Adaptive chucking system202010,578,964Asymmetric template shape modulation for partial field imprinting202010,534,259Method and system for imprint force control202010,489,000Digitizer and method of preparing the same201910,474,266Digitizer and flexible display device comprising the same201910,444,624Active metrology frame and thermal frame temperature control in imprint lithography201910,409,156Mold, imprint apparatus, and method of manufacturing article201910,409,178Alignment control in nanoimprint lithography based on real-time system identification201910,394,362Electrode connection unit and touch screen panel including the same201910,345,955Touch sensor including driving electrode connected to driving channel for each divided area201910,335,984Imprint apparatus and article manufacturing method2019RE047483Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template201910,338,758Touch sensing electrode structure and touch sensor including the same201910,332,943Touch sensor integrated with OLED and OLED display device comprising the same201910,303,314Touch sensor201910,296,155Electrode connecting structure, touch sensor and image display device201910,288,999Methods for controlling extrusions during imprint template replication processes201910,199,244Imprint apparatus, and method of manufacturing article201910,133,406Touch sensor201810,095,340Touch sensor laminate, touch screen panel and image display device including the same201810,056,608Composite cathode active material, method of preparing the composite cathode active material, and cathode and lithium battery each including the composite cathode active material201810,013,127Touch panel and image display device including the same20189,886,127'Touch panel and image display device including the same'20189,816,186'Nano imprinting with reusable polymer template with metallic or oxide coating'20179,778,562'Porous template and imprinting stack for nano-imprint lithography'20179,778,578'Low contact imprint lithography template chuck system for improved overlay correction'20179,770,850'Imprint apparatus and article manufacturing method'20179,725,807'Nano imprinting with reusable polymer template with metallic or oxide coating'20179,616,614'Large area imprint lithography'20179,601,761'Composite cathode active material, method of preparing the composite cathode active material, and cathode and lithium battery each including the composite cathode active material'20179,529,274'Chucking system with recessed support feature'20169,373,868'Composite cathode active material, method of preparing the same, and cathode and lithium battery containing the same'20169,246,171'Cathode active material, and cathode and lithium battery including the material'20169,227,361'Imprint lithography template'20169,223,202'Method of automatic fluid dispensing for imprint lithography processes'20159,170,485'Nano imprinting with reusable polymer template with metallic or oxide coating'20159,164,375'Dual zone template chuck'20158,980,751'Methods and systems of material removal and pattern transfer'20158,968,620'Safe separation for nano imprinting'20158,913,230'Chucking system with recessed support feature'20148,865,046'Imprinting of partial fields at the edge of the wafer'20148,828,297'Patterning of non-convex shaped nanostructures'20148,691,134'Roll-to-roll imprint lithography and purging system'20148,678,633'Lamp electrode printed circuit board and backlight unit including the same'20148,652,393'Strain and kinetics control during separation phase of imprint process'20148,609,326'Methods for exposure for the purpose of thermal management for imprint lithography processes'20138,556,616'Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template'20138,446,395'Liquid crystal display and driving method thereof'20138,432,548'Alignment for edge field nano-imprinting'20138,394,203'In-situ cleaning of an imprint lithography tool'20138,387,482'Method and system to control movement of a body for nano-scale manufacturing'20138,318,066'Step and repeat imprint lithography process'20128,309,008'Separation in an imprint lithography process'20128,289,258'Liquid crystal display'20128,282,383'Method for expelling gas positioned between a substrate and a mold'20128,237,648'Liquid crystal display device having a single source printed circuit board'20128,237,133'Energy sources for curing in an imprint lithography system'20128,231,821'Substrate alignment'20128,215,946'Imprint lithography system and method'20128,212,764'Liquid crystal display and driving method thereof'20128,187,515'Large area roll-to-roll imprint lithography'20128,147,731'Alignment system and method for a substrate in a nano-imprint process'20128,142,704'Imprint lithography system and method'20128,123,514'Conforming template for patterning liquids disposed on substrates'20128,109,754'Method and system for double-sided patterning of substrates'20128,109,753'Double-sided nano-imprint lithography system'20128,057,725'Capillary imprinting technique'20118,044,919'Backlight driving apparatus of LCD and driving method thereof'20118,033,814'Device for holding a template for use in imprint lithography'20118,033,815'Chucking system for nano-manufacturing'20118,033,813'Chucking system comprising an array of fluid chambers'20118,016,277'Flexure based macro motion translation stage'20118,012,395'Template having alignment marks formed of contrast material'20117,980,715'Backlight unit and method for manufacturing the same'20117,944,427'Liquid crystal display and driving method thereof'20117,943,081'Step and repeat imprint lithography processes'20117,935,292'Imprinting of partial fields at the edge of the wafer'20117,931,846'Method to control an atmosphere between a body and a substrate'20117,932,884'Liquid crystal display and driving method thereof'20117,924,391'Liquid crystal display module'20117,910,042'Capillary imprinting technique'20117,906,058'Bifurcated contact printing technique'20117,880,872'Interferometric analysis method for the manufacture of nano-scale devices'20117,837,907'Alignment system and method for a substrate in a nano-imprint process'20107,815,824'Real time imprint process diagnostics for defects'20107,802,978'Imprinting of partial fields at the edge of the wafer'20107,803,308'Technique for separating a mold from solidified imprinting material'20107,798,801'Chucking system for nano-manufacturing'20107,785,096'Enhanced multi channel alignment'20107,780,893'Method of concurrently patterning a substrate having a plurality of fields and a plurality of alignment marks'20107,768,624'Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques'20107,727,453'Step and repeat imprint lithography processes'20107,708,542'Device for holding a template for use in imprint lithography'20107,708,926'Capillary imprinting technique'20107,699,598'Conforming template for patterning liquids disposed on substrates'20107,701,112'Remote center compliant flexure device'20107,691,313'Method for expelling gas positioned between a substrate and a mold'20107,670,529'Method and system for double-sided patterning of substrates'20107,670,530'Patterning substrates employing multiple chucks'20107,670,534'Method to control an atmosphere between a body and a substrate'20107,665,981'System to transfer a template transfer body between a motion stage and a docking plate'20107,641,840'Method for expelling gas positioned between a substrate and a mold'20107,636,999'Method of retaining a substrate to a wafer chuck'20097,635,263'Chucking system comprising an array of fluid chambers'20097,635,445'Method of separating a mold from a solidified layer disposed on a substrate'20097,630,067'Interferometric analysis method for the manufacture of nano-scale devices'20097,491,637'Formation of conductive templates employing indium tin oxide'20097,462,028'Partial vacuum environment imprinting'20087,452,574'Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer'20087,442,336'Capillary imprinting technique'20087,432,634'Remote center compliant flexure device'20087,420,654'Method of varying dimensions of a substrate during nano-scale manufacturing'20087,387,508'Compliant device for nano-scale manufacturing'20087,374,415'Apparatus to control displacement of a body spaced-apart from a surface'20087,338,275'Formation of discontinuous films during an imprint lithography process'20087,323,130'Magnification correction employing out-of-plane distortion of a substrate'20087,316,554'System to control an atmosphere between a body and a substrate'20087,303,383'Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks'20077,298,456'System for varying dimensions of a substrate during nanoscale manufacturing'20077,292,326'Interferometric analysis for the manufacture of nano-scale devices'20077,252,715'System for dispensing liquids'20077,229,273'Imprint lithography template having a feature size under 250 nm'20077,224,443'Imprint lithography substrate processing tool for modulating shapes of substrates'20077,186,483'Method of determining alignment of a template and a substrate having a liquid disposed therebetween'20077,179,079'Conforming template for patterning liquids disposed on substrates'20077,170,589'Apparatus to vary dimensions of a substrate during nano-scale manufacturing'20077,157,036'Method to reduce adhesion between a conformable region and a pattern of a mold'20077,150,622'Systems for magnification and distortion correction for imprint lithography processes'20067,098,572'Apparatus to control displacement of a body spaced-apart from a surface'20067,077,992'Step and repeat imprint lithography processes'20067,070,405'Alignment systems for imprint lithography'20067,060,402'Method of orientating a template with respect to a substrate in response to a force exerted on the template'20067,060,324'Method of creating a dispersion of a liquid on a substrate'20067,036,389'System for determining characteristics of substrates employing fluid geometries'20067,019,819'Chucking system for modulating shapes of substrates'20067,019,835'Method and system to measure characteristics of a film disposed on a substrate'20066,990,870'System for determining characteristics of substrates employing fluid geometries'20066,986,975'Method of aligning a template with a substrate employing moire patterns'20066,982,783'Chucking system for modulating shapes of substrates'20066,980,282'Method for modulating shapes of substrates'20056,955,868'Method to control the relative position between a body and a surface'20056,954,275'Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography'20056,951,173'Assembly and method for transferring imprint lithography templates'20056,932,934'Formation of discontinuous films during an imprint lithography process'20056,926,929'System and method for dispensing liquids'20056,922,906'Apparatus to orientate a body with respect to a surface'20056,921,615'High-resolution overlay alignment methods for imprint lithography'20056,919,152'High resolution overlay alignment systems for imprint lithography'20056,916,584'Alignment methods for imprint lithography'20056,916,585'Method of varying template dimensions to achieve alignment during imprint lithography'20056,902,853'Dual wavelength method of determining a relative position of a substrate and a template'20056,900,881'Step and repeat imprint lithography systems'20056,873,087'High precision orientation alignment and gap control stages for imprint lithography processes'20056,871,558'Method for determining characteristics of substrate employing fluid geometries'20056,870,301'Method of separating a template from a substrate during imprint lithography'20056,842,229'Imprint lithography template comprising alignment marks'20056,805,054'Method, system and holder for transferring templates during imprint lithography processes'20046,696,220'Template for room temperature, low pressure micro-and nano-imprint lithography'20045,204,486'Keyboard device of an electronic keyboard instrument'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2020Patents assigned to MOLECULAR IMPRINTS INC (94)· patent assignee history
2004–2015Patents assigned to UNIV TEXAS (28)· patent assignee history
2004–2010Based in Round Rock, TX, US· patent location history
2005–2020Based in Austin, TX, US· patent location history
2011–2017Patents assigned to CHOI BYUNG-JIN (28)· patent assignee history
2011–2017Patents assigned to SREENIVASAN SIDLGATA V (17)· patent assignee history
2011–2014Based in Gyeongsangbuk-do, KR· patent location history
2016–2020Based in Seoul, KR· patent location history
2018–2020Patents assigned to DONGWOO FINE CHEM CO LTD (16)· patent assignee history
2018–2020Based in Gyeonggi-do, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MOLECULAR IMPRINTS INC | 94 | 2004–2020 |
| CHOI BYUNG-JINself | 28 | 2011–2017 |
| UNIV TEXAS | 28 | 2004–2015 |
| SREENIVASAN SIDLGATA V | 17 | 2011–2017 |
| DONGWOO FINE CHEM CO LTD | 16 | 2018–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 98 | 2005–2020 |
| Round Rock, Texas, US | 37 | 2004–2010 |
| Gyeonggi-do, KR | 11 | 2018–2020 |
| Gyeongsangbuk-do, KR | 8 | 2011–2014 |
| Seoul, KR | 6 | 2016–2020 |