Inventor

Hirotoshi Nakanishi

Inventor

Osaka, JP

Overview

1976–2007

Patent span

Physics

Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%

C07DHeterocyclic compounds17%

C07CAcyclic or carbocyclic compounds14%

G03CPhotosensitive materials for photographic purposes8%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%

PatentTitleYear

7,220,532'Chemical amplification type resist composition'2007 5,714,620'Polyhydric phenol compound and positive resist composition comprising the same'1998 5,591,871'Bislactone compound and a process for producing the same'1997 5,587,492'Polyhydric phenol compound and positive resist composition comprising the same'1996 5,556,995'Process for the preparation of polyhydric phenol compounds'1996 5,436,107'Positive resist composition'1995 5,413,895'Positive resist composition comprising a quinone diazide sulfonic acid ester, a novolak resin and a polyphenol compound.'1995 5,407,778'Positive resist composition'1995 5,407,779'Positive resist composition'1995 5,378,586'Resist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete ester'1995 5,374,742'Positive resist composition'1994 5,362,598'Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye'1994 5,290,657'Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound'1994 5,290,656'Resist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compound'1994 5,283,324'Process for preparing radiation sensitive compound and positive resist composition'1994 5,283,155'Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative'1994 5,275,910'Positive radiation-sensitive resist composition'1994 5,124,228'Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester'1992 5,080,997'Process for preparing a positive resist composition by mixing the condensation product of a quinone diazide sulfonyl halogenide and a phenol with a resin solution without isolating the condensation product from the crude mixture'1992 5,059,507'Positive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resin'1991 4,500,721'Process for producing benzaldehydes'1985 4,220,592'Synthesis of substituted phenylacetic acid'1980 3,956,385'Process for producing sulfonylamides'1976

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–2007Patents assigned to SUMITOMO CHEMICAL CO (23)· patent assignee history

1976–1980Based in Minoo, JP· patent location history

1985–1998Based in Osaka, JP· patent location history

1994Based in Mishima, JP· patent location history

2007Based in Mishima-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SUMITOMO CHEMICAL CO	23	1976–2007

Locations

Location	Patents	Span
Osaka, JP	19	1985–1998
Minoo, JP	2	1976–1980
Mishima-shi, JP	1	2007
Mishima, JP	1	1994