Inventor

Fumio Sugai

Inventor

Osaka, JP

Overview

1995–2018

Patent span

Physics

Primary field (CPC G)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Gprimary

G03GElectrography52%

C07CAcyclic or carbocyclic compounds33%

C07DHeterocyclic compounds13%

H10KOrganic electric solid-state devices2%

PatentTitleYear

10,126,667Quinone derivative and electrophotographic photosensitive member2018 9,964,869Triarylamine derivative, electrophotographic photosensitive member, and method for producing electrophotographic photosensitive member2018 9,783,493'Quinone derivative and electrophotographic photosensitive member'2017 9,783,491'Quinone derivative and electrophotographic photosensitive member'2017 9,690,217'Triarylamine derivative, electrophotographic photosensitive member, and image forming apparatus'2017 9,684,253'Triphenylamine derivative, electrophotographic photosensitive member, and image forming apparatus'2017 9,581,921'Electrophotographic photosensitive member'2017 9,494,881'Triarylamine derivative and electrophotographic photosensitive member'2016 9,454,091'Hydrazone derivative of triphenylamine and electrophotographic photosensitive member'2016 9,447,022'Triarylamine derivative and electrophotographic photosensitive member'2016 9,436,105'Triarylamine derivative and electrophotographic photosensitive member'2016 9,376,371'Triphenylamine derivative, method for manufacturing the same, and electrophotographic photosensitive member'2016 7,468,230'Wet-developing electrophotographic photoconductor and wet-developing image'2008 6,500,592'Electrophotosensitive material'2002 6,395,439'Naphthoquinone derivative and electrophotosensitive material using the same'2002 6,376,142'Electrophotosensitive material containing specific maleimide derivative'2002 6,346,355'Electrophotosensitive material'2002 6,174,638'Naphthalenetetracarboxylic acid diimide derivatives and photosensitive materials for electrophotography'2001 6,127,076'Naphthalenetetracarboxylic acid diimide derivatives and photosensitive material for electrophotography'2000 5,994,012'Naphthoquinone derivative and electrophotosensitive material using same'1999 5,977,389'Naphthoquinone derivative'1999 5,976,742'Naphthoquinone derivative and electrophotographic material using the naphthoquinone derivative'1999 5,863,688'Naphthoquinone derivative'1999 5,817,810'Tryptanthrine compounds'1998 5,773,613'Tryptoanthrinimine derivative and electrophotosensitive material using the same'1998 5,468,874'Benzothiophene/indole-substituted maleimide derivatives, photochromic material comprising said derivatives and optical recording material using the same material'1995

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–1999Patents assigned to MITA INDUSTRIAL CO LTD (7)· patent assignee history

1995–2018Based in Osaka, JP· patent location history

2000–2008Patents assigned to KYOCERA MITA CORP (7)· patent assignee history

2000–2001Based in Chuo-ku, JP· patent location history

2016–2018Patents assigned to KYOCERA DOCUMENT SOLUTIONS INC (12)· patent assignee history

2017Patents assigned to KYOCERA DOCUMENTS SOLUTIONS INC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
KYOCERA DOCUMENT SOLUTIONS INC	12	2016–2018
KYOCERA MITA CORP	7	2000–2008
MITA INDUSTRIAL CO LTD	7	1995–1999
KYOCERA DOCUMENTS SOLUTIONS INC	1	2017

Locations

Location	Patents	Span
Osaka, JP	24	1995–2018
Chuo-ku, JP	2	2000–2001