Inventor

Takahiro Yajima

Inventor

Kyoto, JP

Overview

31→

Patents

1998–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 31 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Fprimary

H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation19%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution19%

Y02PClimate change mitigation technologies in the production or processing of goods19%

C23CCoating metallic material15%

H01JElectric discharge tubes or discharge lamps9%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

B60RVehicles, vehicle fittings, or vehicle parts, not otherwise provided for2%

C30BSingle-crystal growth2%

H01LSemiconductor devices2%

H05KPrinted circuits2%

PatentTitleYear

10,692,915Imaging device and method of manufacturing imaging device2020 10,276,827Device structure and method of producing the same2019 9,463,724'Headrest structure and headrest device'2016 8,702,150'Tonneau cover apparatus'2014 8,465,079'Cover coupling structure'2013 7,074,641'Method of forming silicon-based thin film, silicon-based thin film, and photovoltaic element'2006 6,855,377'Deposited film forming apparatus and deposited film forming method'2005 6,846,521'Apparatus and method for forming deposited film'2005 6,800,539'Thin film formation method'2004 6,675,471'Method of producing high-frequency modules'2004 6,638,359'Deposited film forming apparatus and deposited film forming method'2003 6,632,284'Apparatus and method for forming deposited film'2003 6,530,341'Deposition apparatus for manufacturing thin film'2003 6,531,654'Semiconductor thin-film formation process, and amorphous silicon solar-cell device'2003 6,526,910'Apparatus and method for forming a deposited film by means of plasma CVD'2003 6,495,392'Process for producing a semiconductor device'2002 6,470,823'Apparatus and method for forming a deposited film by a means of plasma CVD'2002 6,472,296'Fabrication of photovoltaic cell by plasma process'2002 6,399,411'Method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device'2002 6,368,944'Method of manufacturing photovoltaic element and apparatus therefor'2002 6,287,943'Deposition of semiconductor layer by plasma process'2001 6,271,055'Process for manufacturing semiconductor element using non-monocrystalline semiconductor layers of first and second conductivity types and amorphous and microcrystalline I-type semiconductor layers'2001 6,162,988'Photovoltaic element'2000 6,159,763'Method and device for forming semiconductor thin film, and method and device for forming photovoltaic element'2000 6,159,300'Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device'2000 6,153,013'Deposited-film-forming apparatus'2000 6,025,039'Method for producing a photovoltaic cell'2000 5,927,994'Method for manufacturing thin film'1999 5,897,332'Method for manufacturing photoelectric conversion element'1999 5,769,963'Photovoltaic device'1998 5,720,826'Photovoltaic element and fabrication process thereof'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2020Patents assigned to CANON KK (26)· patent assignee history

1998–2003Based in Soraku-gun, JP· patent location history

1999–2006Based in Kyoto, JP· patent location history

2000–2003Based in Nishikamo-gun, JP· patent location history

2004Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (1)· patent assignee history

2013–2016Patents assigned to NHK SPRING CO LTD (3)· patent assignee history

2013–2014Patents assigned to SAITO KAZUNORI (2)· patent assignee history

2013–2014Patents assigned to YAJIMA TAKAHIRO (2)· patent assignee history

2013–2016Based in Yokohama, JP· patent location history

2020Based in Odawara, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
CANON KK	26	1998–2020
NHK SPRING CO LTD	3	2013–2016
SAITO KAZUNORI	2	2013–2014
YAJIMA TAKAHIROself	2	2013–2014
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD	1	2004

Locations

Location	Patents	Span
Kyoto, JP	15	1999–2006
Soraku-gun, JP	8	1998–2003
Yokohama, JP	3	2013–2016
Nishikamo-gun, JP	2	2000–2003
Odawara, JP	1	2020