Inventor
Masatoshi Yumoto
Inventor
Shizuoka, JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Dprimary
C07DHeterocyclic compounds13%
C09KMaterials for miscellaneous applications, not provided for elsewhere9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices9%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments7%
H10KOrganic electric solid-state devices7%
H01LSemiconductor devices6%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G03CPhotosensitive materials for photographic purposes4%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
PatentTitleYear
10,717,706M-phenylenediamine compound and method for producing polymer compound using same202010,276,806Coating solution for non-light-emitting organic semiconductor device, organic transistor, compound, organic semiconductor material for non-light-emitting organic semiconductor device, material for organic transistor, method for manufacturing organic transistor, and method for manufacturing organic semiconductor film201910,270,044Coating solution for non-light-emitting organic semiconductor device, organic transistor, compound, organic semiconductor material for non-light-emitting organic semiconductor device, material for organic transistor, method for manufacturing organic transistor, and method for manufacturing organic semiconductor film201910,131,656Organic thin film transistor, method of manufacturing organic thin film transistor, organic thin film transistor material, organic thin film transistor composition, organic semiconductor film, and compound201810,115,911Coating solution for non-light-emitting organic semiconductor device, organic transistor, compound, organic semiconductor material for non-light-emitting organic semiconductor device, material for organic transistor, method for manufacturing organic transistor, and method for manufacturing organic semiconductor film20188,728,708'Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic EL display device, and liquid crystal display device'20147,497,970'Chiral agent for liquid crystal, liquid crystal composition and polymer, as well as filter for optical recording medium, optical recording medium and color filter liquid for crystal'20097,163,997'Polyether derivative and process for producing the same'20076,902,687'OPTICALLY ACTIVE ISOSORBIDE DERIVATIVE AND OPTICALLY ACTIVE ISOMANNIDE DERIVATIVE, PRODUCTION METHODS THEREOF, PHOTO-REACTIVE CHIRAL AGENT, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL COLOR FILTER, OPTICAL FILM AND RECORDING MEDIUM, METHOD FOR CHANGING HELICAL STRUCTURE OF LIQUID CRYSTAL AND METHOD FOR FIXING HELICAL STRUCTURE OF LIQUID CRYSTAL'20056,846,605'Photopolymerizable composition and recording material using same'20056,846,540'OPTICALLY ACTIVE POLYESTERAMIDES, PHOTOREACTIVE CHIRAL AGENTS, LIQUID CRYSTAL COMPOSITIONS, LIQUID CRYSTAL COLOR FILTERS, OPTICAL FILMS AND RECORDING MEDIA, AS WELL AS METHOD FOR CHANGING HELICAL STRUCTURE OF LIQUID CRYSTALS, AND METHOD FOR FIXING HELICAL STRUCTURE OF LIQUID CRYSTALS'20056,800,220'OPTICALLY ACTIVE POLYESTER, PHOTOREACTIVE CHIRAL AGENT, LIQUID CRYSTAL COMPOSITION, LIQUID CRYSTAL COLOR FILTER, OPTICAL FILM, RECORDING MEDIUM, METHOD OF CHANGING THE HELICAL STRUCTURE OF A LIQUID CRYSTAL, AND METHOD OF FIXING THE HELICAL STRUCTURE OF A LIQUID CRYSTAL'20046,800,219'Liquid crystal composition, selectively reflective film and liquid crystal color filter'20046,610,216'OPTICALLY ACTIVE COMPOUND, PHOTOREACTIVE CHIRAL AGENT, LIQUID CRYSTAL COMPOSITION, METHOD FOR CHANGING HELICAL STRUCTURE OF LIQUID CRYSTAL, METHOD FOR FIXING HELICAL STRUCTURE OF LIQUID CRYSTAL, LIQUID CRYSTAL COLOR FILTER, OPTICAL FILM, AND RECORDING MEDIUM'20036,416,922'Azomethine dye precursor, image-forming material, and image-forming method'20026,268,104'Heat-sensitive recording material comprising a uracil coupling component'20016,017,672'Heat-sensitive recording material'20005,652,082'Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same'19975,576,441'Photosensitive bis(halomethyloxadiazole) compound and photosensitive transfer sheet using the same'19965,489,499'Photosensitive trihalomethyl-s-triazine compound and photopolymerizable composition'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2007Patents assigned to FUJI PHOTO FILM CO LTD (13)· patent assignee history
1996–2009Based in Shizuoka, JP· patent location history
1997Based in Shizuoaka, JP· patent location history
2009–2020Patents assigned to FUJIFILM CORP (7)· patent assignee history
2014Based in Haibara-gun, JP· patent location history
2018–2019Patents assigned to UNIV TOKYO (4)· patent assignee history
2018–2020Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI PHOTO FILM CO LTD | 13 | 1996–2007 |
| FUJIFILM CORP | 7 | 2009–2020 |
| UNIV TOKYO | 4 | 2018–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Shizuoka, JP | 13 | 1996–2009 |
| Kanagawa, JP | 5 | 2018–2020 |
| Haibara-gun, JP | 1 | 2014 |
| Shizuoaka, JP | 1 | 1997 |