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Inventor

KOTARO TAKAHASHI

Inventor
JP

Overview

1→
Patents
2025
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Dprimary
C07DHeterocyclic compounds20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients20%
C09DCoating compositions, e.g. paints, varnishes or lacquers20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
PatentTitleYear
12,265,329Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device2025

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025Patents assigned to FUJIFILM CORP (1)· patent assignee history
2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIFILM CORP12025
Locations
LocationPatentsSpan
JP12025