Inventor
Dong-Woon Park
Inventor
Seoul, KR
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
H01LSemiconductor devices11%
H10DInorganic electric semiconductor devices11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
G06FElectric digital data processing5%
A01NPreservation of bodies of humans or animals or plants or parts thereof3%
A61KPreparations for medical, dental or toiletry purposes3%
A61QSpecific use of cosmetics or similar toiletry preparations3%
F42BExplosive charges, e.g. for blasting, fireworks, ammunition3%
PatentTitleYear
11,073,421Methods and apparatuses for measuring optical radiation202110,643,888Overlay marks, methods of forming the same, and methods of fabricating semiconductor devices using the same202010,588,842Use of silicone fluids as insecticides202010,553,438Semiconductor device and method for fabricating the same20209,711,395'Overlay marks, methods of forming the same, and methods of fabricating semiconductor devices using the same'20179,631,908'Arrow'20178,871,104'Method of forming pattern, reticle, and computer readable medium for storing program for forming pattern'20148,691,693'Methods of manufacturing semiconductor device'20148,341,561'Methods of arranging mask patterns and associated apparatus'20127,954,073'Methods of arranging mask patterns responsive to assist feature contribution to image intensity and associated apparatus'20117,937,676'Method of arranging mask patterns and apparatus using the method'20117,877,723'Method of arranging mask patterns and apparatus using the method'20117,460,210'Auto focus system, auto focus method, and exposure apparatus using the same'20087,433,048'Interferometer systems for measuring displacement and exposure systems using the same'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (11)· patent assignee history
2008Based in Anyang-si, KR· patent location history
2008Based in Gyeonggi-do, KR· patent location history
2011–2020Based in Seoul, KR· patent location history
2012–2017Patents assigned to PARK DONG-WOON (4)· patent assignee history
2012Patents assigned to CHOI SEONG-WOON (1)· patent assignee history
2014–2017Patents assigned to BAE YONG-KUG (3)· patent assignee history
2014Patents assigned to CHOI SI-YOUNG (1)· patent assignee history
2020Based in Whitestone, NY, US· patent location history
2021Based in Herndon, VA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 11 | 2008–2020 |
| PARK DONG-WOONself | 4 | 2012–2017 |
| BAE YONG-KUG | 3 | 2014–2017 |
| CHOI SEONG-WOON | 1 | 2012 |
| CHOI SI-YOUNG | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Seoul, KR | 10 | 2011–2020 |
| Herndon, Virginia, US | 1 | 2021 |
| Whitestone, New York, US | 1 | 2020 |
| Anyang-si, KR | 1 | 2008 |
| Gyeonggi-do, KR | 1 | 2008 |