LexDanaLexDanabeta
Inventor

Richard David Jacobs

Inventor
Brookfield, CT, US

Overview

3→
Patents
2012–2016
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
G01BMeasuring length, thickness or similar linear dimensions29%
G01NInvestigating or analysing materials by determining their chemical or physical properties29%
PatentTitleYear
9,285,687'Inspection apparatus, lithographic apparatus, and device manufacturing method'20168,623,576'Time differential reticle inspection'20148,189,203'Reticle inspection systems and method'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2016Patents assigned to ASML HOLDING NV (3)· patent assignee history
2012–2016Patents assigned to CATEY ERIC BRIAN (3)· patent assignee history
2012–2016Patents assigned to SHMAREV YEVGENIY KONSTANTINOVICH (3)· patent assignee history
2012–2014Patents assigned to JACOBS RICHARD DAVID (2)· patent assignee history
2012–2014Patents assigned to THARALDSEN ROBERT ALBERT (2)· patent assignee history
2012–2016Based in Brookfield, CT, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML HOLDING NV32012–2016
CATEY ERIC BRIAN32012–2016
SHMAREV YEVGENIY KONSTANTINOVICH32012–2016
JACOBS RICHARD DAVIDself22012–2014
THARALDSEN ROBERT ALBERT22012–2014
Locations
LocationPatentsSpan
Brookfield, CT, US32012–2016