Inventor
Martin A. Berwick
Inventor
Kendall, NY, US
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Gprimary
G03GElectrography71%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
Y10TTechnical subjects covered by former us classification7%
PatentTitleYear
5,032,481'Photoconductor elements with multiphase stress-dampening interlayers'19914,708,923'Crosslinked vinyl polymer particles and electrographic elements and liquid developers containing such particles'19874,424,268'Pyrylium- and thiopyrylium-sensitized low-persistence photoconductive compositions and elements'19844,284,699'Polyester binder component in multilayer photoconductive element'19814,175,960'Multi-active photoconductive element having an aggregate charge generating layer'19794,175,961'Multi-active photoconductive elements'19794,173,472'Polyester interlayer and binder component in multilayer photoconductive element'19794,127,412'Photoconductive compositions and elements'19784,111,693'Multilayer aggregate photoconductive elements'19784,092,162'Nitrogen containing polymers aelements'1978Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1978–1991Patents assigned to EASTMAN KODAK CO (10)· patent assignee history
1978–1991Based in Kendall, NY, US· patent location history
1987Based in Rochester, NY, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 10 | 1978–1991 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kendall, New York, US | 9 | 1978–1991 |
| Rochester, New York, US | 1 | 1987 |