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Inventor

Youjin Wang

Inventor
San Jose, CA, US

Overview

6→
Patents
2015–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps33%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
H05FStatic electricity20%
G01BMeasuring length, thickness or similar linear dimensions7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
H01LSemiconductor devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
PatentTitleYear
10,775,325Method and system for inspecting an EUV mask202010,643,818Load lock system for charged particle beam imaging202010,088,438Method and system for inspecting an EUV mask20189,859,089'Method and system for inspecting and grounding an EUV mask'20189,485,846'Method and system for inspecting an EUV mask'20169,164,399'Reticle operation system'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015–2018Patents assigned to HERMES MICROVISION INC (4)· patent assignee history
2015Based in Milptas, CA, US· patent location history
2016–2020Based in San Jose, CA, US· patent location history
2018–2020Based in Milpitas, CA, US· patent location history
2020Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HERMES MICROVISION INC42015–2018
ASML NETHERLANDS BV22020
Locations
LocationPatentsSpan
San Jose, California, US32016–2020
Milpitas, California, US22018–2020
Milptas, California, US12015