Inventor

Masaharu Kawakubo

Inventor

Kanagawa, JP

Overview

1996–2013

Patent span

Physics

Primary field (CPC G)

Patents· 16 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices89%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%

PatentTitleYear

8,605,248'Exposure method and lithography system'2013 8,130,362'Correction method and exposure apparatus'2012 7,817,242'Exposure method and device manufacturing method, exposure apparatus, and program'2010 6,876,946'Alignment method and apparatus therefor'2005 6,372,395'Exposure method for overlaying one mask pattern on another'2002 6,331,369'Exposure methods for overlaying one mask pattern on another'2001 6,278,957'Alignment method and apparatus therefor'2001 6,219,130'Position detecting apparatus'2001 6,163,366'Exposure method and apparatus'2000 6,141,107'Apparatus for detecting a position of an optical mark'2000 6,100,987'Position detecting apparatus'2000 5,989,761'Exposure methods for overlaying one mask pattern on another'1999 5,863,680'Exposure method utilizing alignment of superimposed layers'1999 5,760,411'Alignment method for positioning a plurality of shot areas on a substrate'1998 5,654,553'Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate'1997 5,561,606'Method for aligning shot areas on a substrate'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2013Patents assigned to NIKON CORP (16)· patent assignee history

1996Based in Odawara, JP· patent location history

1997–2002Based in Kanagawa, JP· patent location history

2000–2005Based in Kawasaki, JP· patent location history

2010–2013Based in Kumagaya, JP· patent location history

2012–2013Patents assigned to KAWAKUBO MASAHARU (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NIKON CORP	16	1996–2013
KAWAKUBO MASAHARUself	2	2012–2013

Locations

Location	Patents	Span
Kanagawa, JP	9	1997–2002
Kumagaya, JP	3	2010–2013
Kawasaki, JP	3	2000–2005
Odawara, JP	1	1996