Inventor
Katsuya Hayano
Inventor
Hachioji, JP
Overview
Patents· 34 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
H10BElectronic memory devices5%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
G01MTesting static or dynamic balance of machines or structures1%
G01SRadio direction-finding1%
H01JElectric discharge tubes or discharge lamps1%
PatentTitleYear
10,634,990Photomask and methods for manufacturing and correcting photomask202010,394,118Photomask and methods for manufacturing and correcting photomask201910,048,580Photomask and methods for manufacturing and correcting photomask20189,971,238Mask blank, phase shift mask, and production method thereof20189,874,808Mask blank, mask blank with negative resist film, phase shift mask, and method for producing pattern formed body using same20189,519,211'Photomask and methods for manufacturing and correcting photomask'20168,974,987'Photomask and methods for manufacturing and correcting photomask'20157,736,985'Method for manufacturing semiconductor device using overlapping exposure and semiconductor device thereof'20107,387,867'Manufacturing method of semiconductor integrated circuit device'20087,252,910'Fabrication method of semiconductor integrated circuit device and mask fabrication method'20077,172,853'Method of manufacturing semiconductor integrated circuit devices'20077,115,344'Photomask and pattern forming method employing the same'20067,001,712'Manufacturing method of semiconductor integrated circuit device'20066,841,399'Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device'20056,824,958'Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device'20046,750,496'Manufacturing method of semiconductor integrated circuit device, and semiconductor integrated circuit device'20046,733,953'Photomask and pattern forming method employing the same'20046,713,231'Method of manufacturing semiconductor integrated circuit devices'20046,706,452'Method of manufacturing photomask and method of manufacturing semiconductor integrated circuit device'20046,632,744'Manufacturing method of semiconductor integrated circuit device'20036,548,312'Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methods'20036,403,413'Manufacturing method of semiconductor integrated circuit device having a capacitor'20026,383,718'Photomask and pattern forming method employing the same'20026,329,112'Method for measuring aberration of projection lens, method for forming patterns, mask, and method for correcting a projection lens'20016,258,513'Photomask and pattern forming method employing the same'20016,225,011'Method for manufacturing semiconductor devices utilizing plurality of exposure systems'20016,087,074'Photomask and pattern forming method employing the same'20006,013,398'Photomask and pattern forming method employing the same'20005,895,741'Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system'19995,851,703'Photomask and pattern forming method employing the same'19985,700,601'Photomask, manufacture of photomask, formation of pattern, manufacture of semiconductor device, and mask pattern design system'19975,656,400'Photomask and pattern forming method employing the same'19975,578,421'Photomask and pattern forming method employing the same'19965,429,896'Photomask and pattern forming method employing the same'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2010Patents assigned to HITACHI LTD (18)· patent assignee history
1995–2010Based in Hachioji, JP· patent location history
2001–2007Based in Ome, JP· patent location history
2001Based in Ohme, JP· patent location history
2002–2007Based in Akishima, JP· patent location history
2004–2007Patents assigned to RENESAS TECH CORP (8)· patent assignee history
2005–2020Patents assigned to DAINIPPON PRINTING CO LTD (9)· patent assignee history
2008–2020Based in Tokyo, JP· patent location history
2015Patents assigned to HAYANO KATSUYA (1)· patent assignee history
2015Patents assigned to MOHRI HIROSHI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI LTD | 18 | 1995–2010 |
| DAINIPPON PRINTING CO LTD | 9 | 2005–2020 |
| RENESAS TECH CORP | 8 | 2004–2007 |
| HAYANO KATSUYAself | 1 | 2015 |
| MOHRI HIROSHI | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hachioji, JP | 13 | 1995–2010 |
| Tokyo, JP | 8 | 2008–2020 |
| Akishima, JP | 8 | 2002–2007 |
| Ome, JP | 4 | 2001–2007 |
| Ohme, JP | 1 | 2001 |