Inventor
James M. Blackwell
Inventor
Portland, OR, US
Overview
Patents· 30 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1022%
H01LSemiconductor devices21%
H10DInorganic electric semiconductor devices13%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium4%
C23CCoating metallic material3%
H10KOrganic electric solid-state devices3%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%
C09DCoating compositions, e.g. paints, varnishes or lacquers2%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry1%
PatentTitleYear
11,024,538Hardened plug for improved shorting margin202111,011,481Configurable resistor202110,950,501Triblock copolymers for self-aligning vias or contacts202110,892,184Photobucket floor colors with selective grafting202110,892,223Advanced lithography and self-assembled devices202110,796,909Surface-aligned lithographic patterning approaches for back end of line (BEOL) interconnect fabrication202010,615,117Self-aligned via202010,490,416Structures and methods for improved lithographic processing201910,366,950Bottom-up selective dielectric cross-linking to prevent via landing shorts201910,269,623Image tone-reversal with a dielectric using bottom-up cross-linking for back end of line (BEOL) interconnects20199,932,671Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD)20189,570,349'Non-lithographically patterned directed self assembly alignment promotion layers'20179,530,733'Forming layers of materials over small regions by selective chemical reaction including limiting enchroachment of the layers over adjacent regions'20169,418,888'Non-lithographically patterned directed self assembly alignment promotion layers'20169,406,512'Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnects'20169,385,033'Method of forming a metal from a cobalt metal precursor'20169,269,652'Chemically altered carbosilanes for pore sealing applications'20169,090,964'Additives to improve the performance of a precursor source for cobalt deposition'20159,070,553'Cyclic carbosilane dielectric films'20159,041,217'Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnects'20158,969,165'Self-aligned insulating etchstop layer on a metal contact'20158,686,517'Self-aligned insulating etchstop layer on a metal contact'20148,441,006'Cyclic carbosilane dielectric films'20137,989,280'Dielectric interface for group III-V semiconductor device'20117,888,220'Self-aligned insulating etchstop layer on a metal contact'20117,879,739'Thin transition layer between a group III-V substrate and a high-k gate dielectric layer'20117,763,317'High K dielectric growth on metal triflate or trifluoroacetate terminated III-V semiconductor surfaces'20107,485,503'Dielectric interface for group III-V semiconductor device'20097,390,947'Forming field effect transistors from conductors'20086,967,256'Formation of enediynes by reductive coupling followed by alkyne metathesis'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2021Based in Portland, OR, US· patent location history
2008–2021Patents assigned to INTEL CORP (29)· patent assignee history
2013–2016Patents assigned to BLACKWELL JAMES M (5)· patent assignee history
2013–2016Patents assigned to CLARKE JAMES S (2)· patent assignee history
2013–2016Patents assigned to MICHALAK DAVID J (2)· patent assignee history
2015–2016Patents assigned to BRISTOL ROBERT L (2)· patent assignee history
2015Based in Portand, OR, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INTEL CORP | 29 | 2008–2021 |
| BLACKWELL JAMES Mself | 5 | 2013–2016 |
| BRISTOL ROBERT L | 2 | 2015–2016 |
| CLARKE JAMES S | 2 | 2013–2016 |
| MICHALAK DAVID J | 2 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Portland, OR, US | 29 | 2005–2021 |
| Portand, OR, US | 1 | 2015 |