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Inventor

Yuichiro Enomoto

Inventor
Shizuoka, JP

Overview

26→
Patents
2014–2019
Patent span
Chemistry
Primary field (CPC C)

Patents· 26 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
Y10TTechnical subjects covered by former us classification10%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C08LCompositions of macromolecular compounds5%
B29CShaping or joining of plastics4%
H01LSemiconductor devices4%
B82YSpecific uses or applications of nanostructures3%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts2%
PatentTitleYear
10,344,177Under layer film-forming composition for imprints and method for forming pattern201910,248,019Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film201910,175,576Curable composition for photo imprints, method for forming pattern, fine pattern, and method for manufacturing semiconductor device201910,126,653Pattern forming method and resist composition20189,897,922'Method of forming pattern and developer for use in the method'20189,868,846'Curable composition for imprints, patterning method and pattern'20189,862,847'Inkjet discharge method, pattern formation method, and pattern'20189,796,803'Under layer film-forming composition for imprints and method of forming pattern'20179,709,892'Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same'20179,663,671'Curable composition for imprints and method of storing the same'20179,551,935'Pattern forming method and resist composition'20179,507,263'Underlay film composition for imprints and method of forming pattern and pattern formation method using the same'20169,482,958'Method of forming pattern and developer for use in the method'20169,263,289'Adhesion-promoting composition used between curable composition for imprints and substrate, and semiconductor device using the same'20169,223,219'Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film'20159,116,437'Pattern forming method, chemical amplification resist composition and resist film'20159,097,973'Method of forming pattern and developer for use in the method'20158,999,621'Pattern forming method, chemical amplification resist composition and resist film'20158,933,144'Curable composition for imprint, pattern-forming method and pattern'20158,911,930'Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern'20148,877,828'Method for producing curable composition for imprints'20148,871,642'Method of forming pattern and developer for use in the method'20148,820,541'Method for producing curable composition for imprints'20148,808,965'Pattern forming method, pattern, chemical amplification resist composition and resist film'20148,753,802'Pattern forming method, chemical amplification resist composition and resist film'20148,663,907'Method of forming pattern'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2019Patents assigned to FUJIFILM CORP (26)· patent assignee history
2014–2018Patents assigned to ENOMOTO YUICHIRO (13)· patent assignee history
2014–2018Patents assigned to TARUTANI SHINJI (12)· patent assignee history
2014–2018Patents assigned to KAMIMURA SOU (10)· patent assignee history
2014–2018Patents assigned to KATO KEITA (9)· patent assignee history
2014–2019Based in Shizuoka, JP· patent location history
2014–2019Based in Haibara-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
FUJIFILM CORP262014–2019
ENOMOTO YUICHIROself132014–2018
TARUTANI SHINJI122014–2018
KAMIMURA SOU102014–2018
KATO KEITA92014–2018
Locations
LocationPatentsSpan
Shizuoka, JP152014–2019
Haibara-gun, JP112014–2019