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Inventor

Katsuhiko Namba

Inventor
Hirakata, JP

Overview

7→
Patents
1998–2021
Patent span
Physics
Primary field (CPC G)

Patents· 7 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices46%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests38%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy8%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution8%
PatentTitleYear
10,910,617Nonaqueous electrolyte secondary battery20217,144,674'Positive resist composition'20066,953,651'Chemical amplifying type positive resist composition'20056,762,007'Chemical amplification type positive resist composition'20046,696,218'Chemical amplification type positive resist composition'20046,645,692'Photoresist composition'20035,849,457'Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and .gamma. -'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2006Patents assigned to SUMITOMO CHEMICAL CO (6)· patent assignee history
1998Based in Ibaraki, JP· patent location history
2003–2005Based in Hirakata, JP· patent location history
2004Patents assigned to ICHIMURA KUNIHIRO (1)· patent assignee history
2004–2006Based in Toyonaka, JP· patent location history
2021Patents assigned to TOSHIBA INFRASTRUCTURE SYSTEMS & SOLUTIONS CORP (1)· patent assignee history
2021Patents assigned to TOSHIBA KK (1)· patent assignee history
2021Based in Kashiwazaki, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SUMITOMO CHEMICAL CO61998–2006
ICHIMURA KUNIHIRO12004
TOSHIBA INFRASTRUCTURE SYSTEMS & SOLUTIONS CORP12021
TOSHIBA KK12021
Locations
LocationPatentsSpan
Hirakata, JP32003–2005
Toyonaka, JP22004–2006
Kashiwazaki, JP12021
Ibaraki, JP11998