Inventor
WOOKRAE KIM
Inventor
KR
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1019%
G01BMeasuring length, thickness or similar linear dimensions11%
G02BOptical elements, systems or apparatus11%
G06TImage data processing or generation, in general10%
H01LSemiconductor devices6%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
G03HHolographic processes or apparatus3%
G06NComputing arrangements based on specific computational models2%
PatentTitleYear
12,566,144Semiconductor inspection apparatus202612,561,788Fluorescence microscopy metrology system and method of operating fluorescence microscopy metrology system202612,455,228Semiconductor measurement apparatus202512,422,245Semiconductor measurement apparatus202512,405,226Substrate inspection apparatus and substrate inspection method202512,347,096Semiconductor measurement apparatus202512,228,499Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method202512,222,282Semiconductor measurement apparatus202512,045,009Digital holography microscope (DHM), and inspection method and semiconductor manufacturing method using the DHM202412,002,698Metrology apparatus and method based on diffraction using oblique illumination and method of manufacturing semiconductor device using the metrology method202411,972,960Imaging ellipsometry (IE)-based inspection method and method of fabricating semiconductor device by using IE-based inspection method202411,726,046Multi-scale spectral imaging apparatuses and methods, and methods of manufacturing semiconductor devices by using the imaging methods202311,624,699Measurement system capable of adjusting AOI, AOI spread and azimuth of incident light202311,604,136Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method202311,314,205Digital holography microscope (DHM), and inspection method and semiconductor manufacturing method using the DHM202211,264,256Wafer inspection apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (16)· patent assignee history
2022–2026Based in KR· patent location history
2025Patents assigned to UNIV BOSTON (1)· patent assignee history
2026Patents assigned to IUCF HYU (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 16 | 2022–2026 |
| IUCF HYU | 1 | 2026 |
| UNIV BOSTON | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 16 | 2022–2026 |