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Inventor

Naomasa Miyatake

Inventor
Tamano, JP

Overview

5→
Patents
2006–2020
Patent span
Chemistry
Primary field (CPC C)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material45%
H01JElectric discharge tubes or discharge lamps18%
C03CChemical composition of glasses, glazes or vitreous enamels9%
C30BSingle-crystal growth9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
PatentTitleYear
10,669,630Layer-forming device and injector202010,246,776Layer-forming device and layer-forming method20199,194,043'Atomic layer deposition apparatus'20158,440,268'Method and apparatus for growing plasma atomic layer'20137,022,545'Production method of SiC monitor wafer'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2020Patents assigned to MITSUI SHIPBUILDING ENG (5)· patent assignee history
2006–2020Based in Tamano, JP· patent location history
2013–2015Patents assigned to MIYATAKE NAOMASA (2)· patent assignee history
2013–2015Patents assigned to MURATA KAZUTOSHI (2)· patent assignee history
2013–2015Patents assigned to TACHIBANA HIROYUKI (2)· patent assignee history
2013Based in Okayama, JP· patent location history
2019–2020Patents assigned to MITSUI E & S MACH CO LTD (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUI SHIPBUILDING ENG52006–2020
MITSUI E & S MACH CO LTD22019–2020
MIYATAKE NAOMASAself22013–2015
MURATA KAZUTOSHI22013–2015
TACHIBANA HIROYUKI22013–2015
Locations
LocationPatentsSpan
Tamano, JP42006–2020
Okayama, JP12013