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Inventor

William N. Partlo

Inventor
Poway, CA, US

Overview

168→
Patents
1993–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 168 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light25%
H05GX-ray technique13%
B82YSpecific uses or applications of nanostructures6%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light6%
G21KHandling of particles or ionising radiation not otherwise provided for5%
H03KPulse technique4%
H05HPlasma technique3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
11,130,968High throughput assay for measuring adenovirus replication kinetics202111,015,012Hydrophobic polyurethane resins202110,966,308EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods202110,738,325Exogenous gene expression in therapeutic adenovirus for minimal impact on viral kinetics20209,832,853Alignment of light source focus20179,669,334'Material supply apparatus for extreme ultraviolet light source having a filter constructed with a plurality of openings fluidly coupled to a plurality of through holes to remove non-target particles from the supply material'20179,620,920'High pulse repetition rate gas discharge laser'20179,516,730'Systems and methods for buffer gas flow stabilization in a laser produced plasma light source'20169,390,827'EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods'20169,246,298'Corrosion resistant electrodes for laser chambers'20169,119,278'System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output'20159,091,944'Source collector, lithographic apparatus and device manufacturing method'20159,066,412'Systems and methods for cooling an optic'20159,029,813'Filter for material supply apparatus of an extreme ultraviolet light source'20159,000,404'Systems and methods for optics cleaning in an EUV light source'20158,958,143'Master oscillator—power amplifier drive laser with pre-pulse for EUV light source'20158,908,735'Laser system'2014RE045249'System method and apparatus for selecting and controlling light source bandwidth'20148,847,183'System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror'20148,653,437'EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods'20148,654,438'Master oscillator-power amplifier drive laser with pre-pulse for EUV light source'20148,653,491'System, method and apparatus for aligning and synchronizing target material for optimum extreme ultraviolet light output'20148,648,999'Alignment of light source focus'20148,633,459'Systems and methods for optics cleaning in an EUV light source'20148,575,575'System, method and apparatus for laser produced plasma extreme ultraviolet chamber with hot walls and cold collector mirror'20138,462,425'Oscillator-amplifier drive laser with seed protection for an EUV light source'20138,379,687'Gas discharge laser line narrowing module'20138,368,039'EUV light source glint reduction system'20138,368,041'System and method for compensating for thermal effects in an EUV light source'20138,362,391'Laser thin film poly-silicon annealing optical system'20138,304,752'EUV light producing system and method utilizing an alignment laser'20128,283,643'Systems and methods for drive laser beam delivery in an EUV light source'20128,263,953'Systems and methods for target material delivery protection in a laser produced plasma EUV light source'20128,259,764'Bandwidth control device'20128,173,985'Beam transport system for extreme ultraviolet light source'20128,170,078'Laser system'20128,144,740'Laser system'20128,144,739'System method and apparatus for selecting and controlling light source bandwidth'20128,138,487'System, method and apparatus for droplet catcher for prevention of backsplash in a EUV generation chamber'20128,126,027'Line narrowing module'20128,102,889'Multi-chamber gas discharge laser bandwidth control through discharge timing'20128,075,732'EUV collector debris management'20118,000,212'Metrology for extreme ultraviolet light source'20117,999,915'Laser system'20117,995,637'Gas discharge laser chamber'2011RE042588'Control system for a two chamber gas discharge laser system'20117,920,616'Laser system'20117,899,095'Laser lithography system with improved bandwidth control'20117,885,309'Laser system'20117,884,303'Laser thin film poly-silicon annealing optical system'20117,838,854'Method and apparatus for EUV plasma source target delivery'20107,830,934'Multi-chamber gas discharge laser bandwidth control through discharge timing'20107,822,092'Laser system'20107,812,329'System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus'20107,778,302'Laser system'20107,746,913'Laser system'20107,715,459'Laser system'20107,671,349'Laser produced plasma EUV light source'20107,643,529'Laser system'20107,643,528'Immersion lithography laser light source with pulse stretcher'20107,633,989'High pulse repetition rate gas discharge laser'20097,630,424'Laser system'20097,598,509'Laser produced plasma EUV light source'20097,596,164'Control system for a two chamber gas discharge laser'20097,567,607'Very narrow band, two chamber, high rep-rate gas discharge laser system'20097,522,650'Gas discharge laser chamber improvements'20097,518,787'Drive laser for EUV light source'20097,471,708'Gas discharge laser output light beam parameter control'20087,405,416'Method and apparatus for EUV plasma source target delivery'20087,369,596'Chamber for a high energy excimer laser source'20087,368,741'Extreme ultraviolet light source'20087,365,349'EUV light source collector lifetime improvements'20087,366,219'Line narrowing module'20087,361,918'High repetition rate laser produced plasma EUV light source'20087,346,093'DUV light source optical element improvements'20087,323,703'EUV light source'20087,317,196'LPP EUV light source'20087,291,853'Discharge produced plasma EUV light source'20077,288,777'Collector for EUV light source'20077,277,466'High power gas discharge laser with helium purged line narrowing unit'20077,247,870'Systems for protecting internal components of an EUV light source from plasma-generated debris'20077,218,661'Line selected F2 two chamber laser system'20077,217,940'Collector for EUV light source'20077,180,083'EUV light source collector erosion mitigation'20077,164,144'EUV light source'20077,154,928'Laser output beam wavefront splitter for bandwidth spectrum control'20067,149,234'High repetition rate gas discharge laser with precise pulse timing control'20067,141,806'EUV light source collector erosion mitigation'20067,109,503'Systems for protecting internal components of an EUV light source from plasma-generated debris'20067,088,758'Relax gas discharge laser lithography light source'20067,087,914'High repetition rate laser produced plasma EUV light source'20067,079,564'Control system for a two chamber gas discharge laser'20067,061,961'Very narrow band, two chamber, high rep-rate gas discharge laser system'20067,061,959'Laser thin film poly-silicon annealing system'20067,058,107'Line selected F2 two chamber laser system'20067,039,086'Control system for a two chamber gas discharge laser'20067,002,443'Method and apparatus for cooling magnetic circuit elements'20066,985,508'Very narrow band, two chamber, high reprate gas discharge laser system'20066,972,421'Extreme ultraviolet light source'20056,882,674'Four KHz gas discharge laser system'20056,815,700'Plasma focus light source with improved pulse power system'20046,801,560'Line selected F2 two chamber laser system'20046,795,474'Gas discharge laser with improved beam path'20046,778,584'High power gas discharge laser with helium purged line narrowing unit'20046,765,946'Fan for gas discharge laser'20046,765,945'Injection seeded F2 laser with pre-injection filter'20046,757,316'Four KHz gas discharge laser'20046,744,060'Pulse power system for extreme ultraviolet and x-ray sources'20046,738,410'Line narrowed laser with bidirection beam expansion'20046,713,770'High resolution spectral measurement device'20046,704,340'Lithography laser system with in-place alignment tool'20046,690,704'Control system for a two chamber gas discharge laser'20046,661,826'Laser chamber insulator with sealed electrode feedthrough'20036,625,191'Very narrow band, two chamber, high rep rate gas discharge laser system'20036,621,846'Electric discharge laser with active wavelength chirp correction'20036,618,421'High repetition rate gas discharge laser with precise pulse timing control'20036,590,922'Injection seeded F2 laser with line selection and discrimination'20036,586,757'Plasma focus light source with active and buffer gas control'20036,567,450'Very narrow band, two chamber, high rep rate gas discharge laser system'20036,566,667'Plasma focus light source with improved pulse power system'20036,566,668'Plasma focus light source with tandem ellipsoidal mirror units'20036,556,600'Injection seeded F2 laser with centerline wavelength control'20036,549,551'Injection seeded laser with precise timing control'2003RE038054'Reliable, modular, production quality narrow-band high rep rate F2 laser'20036,541,786'Plasma pinch high energy with debris collector'20036,538,737'High resolution etalon-grating spectrometer'20036,532,247'Laser wavelength control unit with piezoelectric driver'20036,480,275'High resolution etalon-grating monochromator'20026,477,193'Extreme repetition rate gas discharge laser with improved blower motor'20026,452,199'Plasma focus high energy photon source with blast shield'20026,442,181'Extreme repetition rate gas discharge laser'20026,425,559'Gas laser chamber with vertical vibration isolator'20026,381,257'Very narrow band injection seeded F2 lithography laser'20026,370,174'Injection seeded F2 lithography laser'20026,359,922'Single chamber gas discharge laser with line narrowed seed beam'20026,330,261'Reliable, modular, production quality narrow-band high rep rate ArF excimer laser'20016,327,286'High speed magnetic modulator voltage and temperature timing compensation circuit'20016,317,447'Electric discharge laser with acoustic chirp correction'20016,240,112'High pulse rate pulse power system with liquid cooling'20016,208,674'Laser chamber with fully integrated electrode feedthrough main insulator'20016,151,346'High pulse rate pulse power system with fast rise time and low current'20006,128,323'Reliable modular production quality narrow-band high REP rate excimer laser'20006,067,311'Excimer laser with pulse multiplier'20006,064,072'Plasma focus high energy photon source'20006,058,739'Long life fused silica ultraviolet optical elements'20006,051,841'Plasma focus high energy photon source'20006,034,978'Gas discharge laser with gas temperature control'20006,028,872'High pulse rate pulse power system with resonant power supply'20006,026,103'Gas discharge laser with roller bearings and stable magnetic axial positioning'20006,018,537'Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser'20006,016,325'Magnetic modulator voltage and temperature timing compensation circuit'20005,991,324'Reliable. modular, production quality narrow-band KRF excimer laser'19995,949,806'High voltage cable interlock circuit'19995,940,421'Current reversal prevention circuit for a pulsed gas discharge laser'19995,936,988'High pulse rate pulse power system'19995,914,974'Method and apparatus for eliminating reflected energy due to stage mismatch in nonlinear magnetic compression modules'19995,844,727'Illumination design for scanning microlithography systems'19985,818,865'Compact excimer laser insulator with integral pre-ionizer'19985,771,258'Aerodynamic chamber design for high pulse repetition rate excimer lasers'19985,763,930'Plasma focus high energy photon source'19985,757,470'Variable annular illuminator for photolithographic projection imager'19985,748,656'Laser having improved beam quality and reduced operating cost'19985,729,562'Pulse power generating circuit with energy recovery'19985,684,822'Laser system with anamorphic confocal unstable resonator'19975,601,733'Full field mask illumination enhancement methods and apparatus'19975,452,054'Variable annular illuminator for photolithographic projection imager'19955,383,000'Partial coherence varier for microlithographic system'19955,233,460'Method and means for reducing speckle in coherent laser pulses'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–1998Based in Fairport, NY, US· patent location history
1997–2014Patents assigned to CYMER INC (137)· patent assignee history
1997–2020Based in San Diego, CA, US· patent location history
1999–2021Based in Poway, CA, US· patent location history
2011–2017Patents assigned to PARTLO WILLIAM N (29)· patent assignee history
2011–2016Patents assigned to FOMENKOV IGOR V (17)· patent assignee history
2014–2017Patents assigned to Cymer LLC (13)· patent assignee history
2014–2021Patents assigned to ASML NETHERLANDS BV (12)· patent assignee history
2021Based in La Jolla, CA, US· patent location history
2021Based in Inver Grove Heights, MN, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CYMER INC1371997–2014
PARTLO WILLIAM Nself292011–2017
FOMENKOV IGOR V172011–2016
Cymer LLC132014–2017
ASML NETHERLANDS BV122014–2021
Locations
LocationPatentsSpan
Poway, California, US1451999–2021
San Diego, California, US171997–2020
Fairport, New York, US31995–1998
La Jolla, California, US12021
Inver Grove Heights, Minnesota, US12021