Inventor
Savitha Nanjangud
Inventor
San Jose, CA, US
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
B24BMachines, devices, or processes for grinding or polishing20%
G01NInvestigating or analysing materials by determining their chemical or physical properties10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
G06FElectric digital data processing10%
G06TImage data processing or generation, in general10%
H01LSemiconductor devices10%
PatentTitleYear
9,710,903'System and method for detecting design and process defects on a wafer using process monitoring features'20176,632,124'Optical monitoring in a two-step chemical mechanical polishing process'20036,506,097'Optical monitoring in a two-step chemical mechanical polishing process'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2003–2017Based in San Jose, CA, US· patent location history
2017Patents assigned to EDELSTEIN SERGIO (1)· patent assignee history
2017Patents assigned to FOUQUET CHRISTOPHE (1)· patent assignee history
2017Patents assigned to HESS CARL (1)· patent assignee history
2017Patents assigned to KLA TENCOR CORP (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 2 | 2003 |
| EDELSTEIN SERGIO | 1 | 2017 |
| FOUQUET CHRISTOPHE | 1 | 2017 |
| HESS CARL | 1 | 2017 |
| KLA TENCOR CORP | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 3 | 2003–2017 |