Inventor
Liang-Guang Chen
Inventor
Hsinchu, TW
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H01LSemiconductor devices13%
H10DInorganic electric semiconductor devices13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
B24BMachines, devices, or processes for grinding or polishing7%
C09GPolishing compositions7%
C09KMaterials for miscellaneous applications, not provided for elsewhere7%
C11DDetergent compositions7%
G06FElectric digital data processing7%
H04LTransmission of digital information, e.g. telegraphic communication7%
PatentTitleYear
10,967,478Chemical mechanical polishing apparatus and method202110,961,487Semiconductor device cleaning solution, method of use, and method of manufacture202110,937,691Methods of forming an abrasive slurry and methods for chemical-mechanical polishing202110,657,216Routerless networks-on-chip2020Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2020Patents assigned to UNIV OREGON STATE (1)· patent assignee history
2020Based in Portland, OR, US· patent location history
2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (3)· patent assignee history
2021Based in Hsinchu, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 3 | 2021 |
| UNIV OREGON STATE | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 3 | 2021 |
| Portland, OR, US | 1 | 2020 |