Inventor
Nobuyuki Morimoto
Inventor
Tokyo, JP
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1039%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1033%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry5%
C01BNon-metallic elements5%
C07CAcyclic or carbocyclic compounds5%
H10DInorganic electric semiconductor devices5%
A61KPreparations for medical, dental or toiletry purposes2%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations2%
F24CDomestic stoves or ranges2%
H05KPrinted circuits2%
PatentTitleYear
8,987,230'Hybrid gel comprising chemically crosslinked hyaluronic acid derivative and pharmaceutical composition comprising the same'20158,802,540'Method of manufacturing bonded wafer'20148,183,133'Method for producing semiconductor substrate'20128,048,767'Bonded wafer and method for producing bonded wafer'20118,048,769'Method for producing bonded wafer'20118,003,494'Method for producing a bonded wafer'20117,951,692'Method of producing semiconductor substrate having an SOI structure'20117,927,957'Method for producing bonded silicon wafer'20117,902,043'Method of producing bonded wafer'20117,858,494'Laminated substrate manufacturing method and laminated substrate manufactured by the method'20107,855,132'Method of manufacturing bonded wafer'20107,851,337'Method for producing semiconductor substrate'20107,799,655'Method for evaluation of bonded wafer'20107,795,117'Method of producing semiconductor substrate having an SOI structure'20107,713,838'SOI wafer and its manufacturing method'20107,563,697'Method for producing SOI wafer'20097,544,583'SOI wafer and its manufacturing method'20097,534,728'Process for cleaning silicon substrate'20097,510,948'Method for producing SOI wafer'20097,507,641'Method of producing bonded wafer'20097,494,899'Method for manufacturing semiconductor substrate'20097,446,016'Method for producing bonded wafer'20087,358,147'Process for producing SOI wafer'20086,401,709'Range hood'20024,766,263'Hydrocarbon synthesis process utilizing crystalline aluminosilicate catalyst'19884,695,440'Crystalline aluminosilicate ISI-6'19874,578,259'Process for preparing a crystalline aluminosilicate'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986–1988Patents assigned to RES ASS PETROLEUM ALTERNAT DEV (3)· patent assignee history
1986–1988Based in Sodegaura, JP· patent location history
2008–2014Patents assigned to SUMCO CORP (22)· patent assignee history
2008–2012Based in Tokyo, JP· patent location history
2010–2014Based in Yamagata, JP· patent location history
2011Based in Minato-ku, JP· patent location history
2012–2015Patents assigned to MORIMOTO NOBUYUKI (3)· patent assignee history
2012–2014Patents assigned to ENDO AKIHIKO (2)· patent assignee history
2015Patents assigned to AKIYOSHI KAZUNARI (1)· patent assignee history
2015Based in Bunkyo-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SUMCO CORP | 22 | 2008–2014 |
| MORIMOTO NOBUYUKIself | 3 | 2012–2015 |
| RES ASS PETROLEUM ALTERNAT DEV | 3 | 1986–1988 |
| ENDO AKIHIKO | 2 | 2012–2014 |
| AKIYOSHI KAZUNARI | 1 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 19 | 2008–2012 |
| Sodegaura, JP | 3 | 1986–1988 |
| Yamagata, JP | 2 | 2010–2014 |
| Bunkyo-ku, JP | 1 | 2015 |
| Minato-ku, JP | 1 | 2011 |