Inventor
Eric Scott Moyer
Inventor
Midland, MI, US
Overview
Patents· 38 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds17%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
C08LCompositions of macromolecular compounds8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y10TTechnical subjects covered by former us classification6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form4%
C07CAcyclic or carbocyclic compounds3%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
9,976,041UV-curable silicone compositions and anti-dust coating compositions containing same20189,086,626'Photo-patternable and developable silsesquioxane resins for use in device fabrication'20159,029,269'Wafer bonding system and method for bonding and debonding thereof'20159,023,433'Silsesquioxane resins and method of using them to form an antireflective coating'20158,828,252'Method and materials for reverse patterning'20148,809,482'Silsesquioxane resins'20148,785,113'Method and materials for reverse patterning'20148,728,335'Method and materials for double patterning'20148,658,284'Polysilane—polysilazane copolymers and methods for their preparation and use'20148,653,217'Method for forming anti-reflective coating'20148,648,125'Stabilization of silsesquioxane resins'20148,524,439'Silsesquioxane resin systems with base additives bearing electron-attracting functionalities'20138,507,179'Switchable antireflective coatings'20138,377,634'Radiation sensitive silicone resin composition'20138,304,161'Silsesquioxane resins'20128,263,312'Antireflective coating material'20128,241,707'Silsesquioxane resins'20128,148,043'Silsesquioxane resin systems with base additives bearing electron-attracting functionalities'20128,088,547'Resist composition'20128,025,927'Method for forming anti-reflective coating'20117,833,696'Method for forming anti-reflective coating'20107,756,384'Method for forming anti-reflective coating'20107,625,687'Silsesquioxane resin'20097,368,173'Siloxane resin-based anti-reflective coating composition having high wet etch rate'20086,759,133'High modulus, low dielectric constant coatings'20046,727,038'Photodefineable compositions'20046,576,300'High modulus, low dielectric constant coatings'20036,558,755'Plasma curing process for porous silica thin film'20036,395,825'Process for synthesis of silicone resin'20026,281,285'Silicone resins and process for synthesis'20016,231,989'Method of forming coatings'20016,083,661'Photodefineable cyclobutarene compositions'20005,882,836'Photocurable formulation containing a partially polymerized divinylsiloxane linked bisbenzocyclobutene resin'19995,854,302'Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins'19985,585,450'Oligomerized cyclobutarene resins'19965,489,623'Photodefinable polymers containing perfluorocyclobutane groups'19965,464,925'Benzocyclobutene-terminated polymides'19955,426,164'Photodefinable polymers containing perfluorocyclobutane groups'1995Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1995–2000Patents assigned to DOW CHEMICAL CO (7)· patent assignee history
1995–2018Based in Midland, MI, US· patent location history
2001–2018Patents assigned to DOW CORNING (30)· patent assignee history
2012–2015Patents assigned to MOYER ERIC SCOTT (14)· patent assignee history
2012–2015Patents assigned to FU PENG-FEI (8)· patent assignee history
2012–2015Patents assigned to WANG SHENG (8)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DOW CORNING | 30 | 2001–2018 |
| MOYER ERIC SCOTTself | 14 | 2012–2015 |
| FU PENG-FEI | 8 | 2012–2015 |
| WANG SHENG | 8 | 2012–2015 |
| DOW CHEMICAL CO | 7 | 1995–2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Midland, MI, US | 38 | 1995–2018 |