LexDanaLexDanabeta
Inventor

Satoru Kawakami

Inventor
Sagamihara, JP

Overview

28→
Patents
1983–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps26%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
C23CCoating metallic material14%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy3%
H04NPictorial communication, e.g. television3%
H05KPrinted circuits3%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution3%
B24BMachines, devices, or processes for grinding or polishing2%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors2%
C01BNon-metallic elements2%
PatentTitleYear
10,920,120Ceria composite particle dispersion, method for producing same, and polishing abrasive grain dispersion comprising ceria composite particle dispersion202110,570,512Substrate processing apparatus20209,793,569'Electric storage element'20179,633,821'Microwave plasma processing apparatus and microwave supplying method'20179,337,945'Receiving apparatus and receiving method for receiving broadcasting waves of different frequency bands'20169,305,751'Microwave plasma processing apparatus and microwave supplying method'20169,034,513'Energy storage device'20158,522,958'Vacuum processing apparatus'20138,337,621'Substrate processing apparatus'20127,634,225'Signal reception device, signal reception circuit, and reception device'20097,030,938'Tuner and receiver apparatus'20066,558,508'Processing apparatus having dielectric plates linked together by electrostatic force'20036,501,082'Plasma deposition apparatus and method with controller'20026,470,824'Semiconductor manufacturing apparatus'20026,452,400'Method of measuring negative ion density of plasma and plasma processing method and apparatus for carrying out the same'20026,432,208'Plasma processing apparatus'20026,431,114'Method and apparatus for plasma processing'20026,399,520'Semiconductor manufacturing method and semiconductor manufacturing apparatus'20026,358,324'Microwave plasma processing apparatus having a vacuum pump located under a susceptor'20026,284,674'Plasma processing device and a method of plasma process'20016,161,498'Plasma processing device and a method of plasma process'20006,066,568'Plasma treatment method and system'20005,665,167'Plasma treatment apparatus having a workpiece-side electrode grounding circuit'19975,665,166'Plasma processing apparatus'19975,542,559'Plasma treatment apparatus'19965,494,522'Plasma process system and method'19965,478,429'Plasma process apparatus'19954,407,999'Water repellent adhesive composition for wooden material'1983

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1995–2020Patents assigned to TOKYO ELECTRON LTD (21)· patent assignee history
1995–2003Based in Sagamihara, JP· patent location history
2000–2001Patents assigned to FUJI ELECTRIC CO LTD (2)· patent assignee history
2000–2016Based in Kanagawa, JP· patent location history
2006–2016Patents assigned to SONY CORP (3)· patent assignee history
2012–2016Patents assigned to KAWAKAMI SATORU (3)· patent assignee history
2015–2017Patents assigned to Lithium Energy Japan (2)· patent assignee history
2015–2017Based in Ritto, JP· patent location history
2016–2020Based in Miyagi, JP· patent location history
2021Based in Kitakyushu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD211995–2020
KAWAKAMI SATORUself32012–2016
SONY CORP32006–2016
FUJI ELECTRIC CO LTD22000–2001
Lithium Energy Japan22015–2017
Locations
LocationPatentsSpan
Sagamihara, JP151995–2003
Kanagawa, JP42000–2016
Miyagi, JP32016–2020
Ritto, JP22015–2017
Kitakyushu, JP12021