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Inventor

Yoshihiko Takano

Inventor
Otsu, JP

Overview

25→
Patents
1989–2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material20%
H01GCapacitors9%
H10NElectric solid-state devices not otherwise provided for9%
Y10TTechnical subjects covered by former us classification9%
C25DProcesses for the electrolytic or electrophoretic production of coatings7%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds5%
G01NInvestigating or analysing materials by determining their chemical or physical properties5%
H05KPrinted circuits5%
C01BNon-metallic elements4%
H01LSemiconductor devices4%
PatentTitleYear
9,608,213'Method for manufacturing functional material and electronic component'20179,021,866'Gas leak detector'20158,871,684'Iron-based superconducting wire and method for producing the same'20148,341,815'Method for manufacturing laminated electronic component'20138,309,494'Iron-based superconducting substance'20128,154,849'Laminated electronic component'20127,976,893'Superconductivity in boron-doped diamond thin film'20117,765,661'Method for manufacturing ceramic electronic component and planting bath'20107,719,819'Laminated electronic component and method for manufacturing the same'20106,911,138'Method for plating electrodes of ceramic chip electronic components'20056,839,578'Method of forming high temperature superconducting Josephson junction'20056,682,621'Method of forming high temperature superconducting josephson junction'20046,572,930'Holder for electroless plating and method of electroless plating'20036,471,777'Holder for electroless plating and method of electroless plating'20026,460,401'Method and apparatus for trace analysis of organic compound'20026,048,496'Mixer for liquid chromatograph'20005,576,053'Method for forming an electrode on an electronic part'19965,435,830'Method of producing fine powders'19955,368,896'Electroless bismuth plating bath'19945,364,459'Electroless plating solution'19945,360,471'Electroless solder plating bath'19945,306,335'Electroless bismuth plating bath'19945,292,377'Flux suitable for coating molten zinc, molten alloy of aluminum and zinc, and molten aluminum'19945,160,373'Electroless plating bath'19924,871,585'Method of plating treatment'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989–2017Patents assigned to MURATA MANUFACTURING CO (16)· patent assignee history
1989–1996Based in Kyoto, JP· patent location history
1992–2017Based in Nagaokakyo, JP· patent location history
1994–2013Based in Otsu, JP· patent location history
2000–2015Based in Iruma, JP· patent location history
2004–2014Patents assigned to NAT INST FOR MATERIALS SCIENCE (5)· patent assignee history
2004–2014Based in Ibaraki, JP· patent location history
2012–2015Patents assigned to TAKANO YOSHIHIKO (5)· patent assignee history
2012–2013Patents assigned to KASHIO HIDEYUKI (2)· patent assignee history
2012–2013Patents assigned to KUNISHI TATSUO (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MURATA MANUFACTURING CO161989–2017
NAT INST FOR MATERIALS SCIENCE52004–2014
TAKANO YOSHIHIKOself52012–2015
KASHIO HIDEYUKI22012–2013
KUNISHI TATSUO22012–2013
Locations
LocationPatentsSpan
Otsu, JP71994–2013
Kyoto, JP61989–1996
Ibaraki, JP42004–2014
Nagaokakyo, JP31992–2017
Iruma, JP22000–2015