Inventor
Jianhong Wu
Inventor
Jiangsu, CN
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus21%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
G03HHolographic processes or apparatus21%
H04QSelecting14%
C23CCoating metallic material7%
C23FNon-mechanical removal of metallic material from surface7%
H04LTransmission of digital information, e.g. telegraphic communication7%
PatentTitleYear
10,838,361Holographic grating lithography system and a method for adjusting the self-collimation of the interference optical path thereof20209,864,113'Method for manufacturing holographic blazed grating'20189,380,359'Method and a device of service migration in an automatically switched optical network'20169,075,194'Method for manufacturing holographic bi-blazed grating'20158,868,967'Method and system for connection-error handling of service in an automatically switched optical network'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2016Patents assigned to WU JIANHONG (2)· patent assignee history
2014–2016Patents assigned to ZTE CORP (2)· patent assignee history
2014–2016Based in Shenzhen, CN· patent location history
2015–2020Patents assigned to UNIV SOOCHOW (3)· patent assignee history
2015–2018Based in Jiangsu, CN· patent location history
2016Patents assigned to LI BIN (1)· patent assignee history
2020Based in Suzhou, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNIV SOOCHOW | 3 | 2015–2020 |
| WU JIANHONGself | 2 | 2014–2016 |
| ZTE CORP | 2 | 2014–2016 |
| LI BIN | 1 | 2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Jiangsu, CN | 2 | 2015–2018 |
| Shenzhen, CN | 2 | 2014–2016 |
| Suzhou, CN | 1 | 2020 |