LexDanaLexDanabeta
Inventor

Daniel J. Woodruff

Inventor
Kalispell, MT, US

Overview

84→
Patents
1992–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 84 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C25Dprimary
C25DProcesses for the electrolytic or electrophoretic production of coatings34%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
G11BInformation storage based on relative movement between record carrier and transducer5%
Y10TTechnical subjects covered by former us classification4%
H01LSemiconductor devices3%
A61KPreparations for medical, dental or toiletry purposes2%
B25JManipulators2%
B65GTransport or storage devices, e.g. conveyors for loading or tipping, shop conveyor systems or pneumatic tube conveyors2%
C12NMicroorganisms or enzymes2%
PatentTitleYear
11,112,697Method and apparatus for post exposure processing of photoresist wafers202110,837,119Microelectronic substrate electro processing system202010,494,731Electroplating dynamic edge control201910,474,033Method and apparatus for post exposure processing of photoresist wafers201910,260,855Electroplating tool with feedback of metal thickness distribution and correction201910,203,604Method and apparatus for post exposure processing of photoresist wafers201910,047,453Electroplating apparatus20189,309,603'Component cleaning in a metal plating apparatus'20169,068,272'Electroplating processor with thin membrane support'20158,968,533'Electroplating processor with geometric electrolyte flow path'20158,562,752'Single workpiece processing chamber'20138,500,968'Deplating contacts in an electrochemical plating apparatus'20138,313,631'Apparatus and methods for electrochemical processing of microfeature wafers'20128,118,044'Single workpiece processing chamber with tilting load/unload upper rim'20128,104,488'Single side workpiece processing'20128,082,932'Single side workpiece processing'20117,935,230'Electro-chemical processor'20117,931,786'Apparatus and method for agitating liquids in wet chemical processing of microfeature workpieces'20117,927,469'Electro-chemical processor'20117,909,967'Electro-chemical processor'20117,842,173'Apparatus and methods for electrochemical processing of microfeature wafers'20107,531,060'Integrated tool assemblies with intermediate processing modules for processing of microfeature workpieces'20097,524,406'Processing apparatus including a reactor for electrochemically etching microelectronic workpiece'20097,420,690'End point detection in workpiece processing'20087,393,439'Integrated microfeature workpiece processing tools with registration systems for paddle reactors'20087,390,382'Reactors having multiple electrodes and/or enclosed reciprocating paddles, and associated methods'20087,390,383'Paddles and enclosures for enhancing mass transfer during processing of microfeature workpieces'20087,357,850'Electroplating apparatus with segmented anode array'20087,334,826'End-effectors for handling microelectronic wafers'20087,313,462'Integrated tool with automated calibration system and interchangeable wet processing components for processing microfeature workpieces'20077,281,741'End-effectors for handling microelectronic workpieces'20077,198,694'Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems'20077,147,760'Electroplating apparatus with segmented anode array'20067,118,658'Electroplating reactor'20067,087,143'Plating system for semiconductor materials'20067,074,246'Modular semiconductor workpiece processing tool'20067,002,698'Semiconductor processing apparatus having lift and tilt mechanism'20066,991,710'Apparatus for manually and automatically processing microelectronic workpieces'20066,976,822'End-effectors and transfer devices for handling microelectronic workpieces'20056,921,467'Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces'20056,916,412'Adaptable electrochemical processing chamber'20056,890,415'Reactor vessel having improved cup, anode and conductor assembly'20056,869,510'Methods and apparatus for processing the surface of a microelectronic workpiece'20056,849,167'Electroplating reactor including back-side electrical contact apparatus'20056,773,559'Processing apparatus including a reactor for electrochemically etching a microelectronic workpiece'20046,773,560'Dry contact assemblies and plating machines with dry contact assemblies for plating microelectronic workpieces'20046,752,584'TRANSFER DEVICES FOR HANDLING MICROELECTRONIC WORKPIECES WITHIN AN ENVIRONMENT OF A PROCESSING MACHINE AND METHODS OF MANUFACTURING AND USING SUCH DEVICES IN THE PROCESSING OF MICROELECTRONIC WORKPIECES'20046,749,391'Microelectronic workpiece transfer devices and methods of using such devices in the processing of microelectronic workpieces'20046,749,390'Integrated tools with transfer devices for handling microelectronic workpieces'20046,699,373'Apparatus for processing the surface of a microelectronic workpiece'20046,672,820'Semiconductor processing apparatus having linear conveyer system'20046,654,122'Semiconductor processing apparatus having lift and tilt mechanism'20036,645,355'Semiconductor processing apparatus having lift and tilt mechanism'20036,645,356'Methods and apparatus for processing the surface of a microelectronic workpiece'20036,623,609'Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same'20036,527,926'Electroplating reactor including back-side electrical contact apparatus'20036,497,801'Electroplating apparatus with segmented anode array'20026,440,178'Modular semiconductor workpiece processing tool'20026,428,662'Reactor vessel having improved cup, anode and conductor assembly'20026,428,660'Reactor vessel having improved cup, anode and conductor assembly'20026,409,892'Reactor vessel having improved cup, anode, and conductor assembly'20026,342,137'Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same'20026,322,678'Electroplating reactor including back-side electrical contact apparatus'20016,322,677'Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same'20016,309,520'Methods and apparatus for processing the surface of a microelectronic workpiece'20016,309,524'Methods and apparatus for processing the surface of a microelectronic workpiece'20016,303,010'Methods and apparatus for processing the surface of a microelectronic workpiece'20016,280,583'Reactor assembly and method of assembly'20016,280,582'Reactor vessel having improved cup, anode and conductor assembly'20016,228,232'Reactor vessel having improved cup anode and conductor assembly'20016,203,582'Modular semiconductor workpiece processing tool'20016,168,695'Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same'20016,091,498'Semiconductor processing apparatus having lift and tilt mechanism'20006,080,291'Apparatus for electrochemically processing a workpiece including an electrical contact assembly having a seal member'20005,894,941'Cartridge rack and library for engaging same'19995,867,344'Cartridge spine and library employing same'19995,739,978'Cartridge handling system with moving I/O drive'19985,731,678'Processing head for semiconductor processing machines'19985,718,339'Cartridge rack and library for engaging same'19985,607,275'Cartridge library and method of operation'19975,498,116'Entry-exit port for cartridge library'19965,487,579'Picker mechanism for data cartridges'19965,317,554'Magazine loader having an ejector arm'19945,153,862'Cassette for storing, moving and loading optical storage disk cartridges'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–1994Based in Colorado Springs, CO, US· patent location history
1996–1999Patents assigned to EXABYTE CORP (7)· patent assignee history
1996–1999Based in Lyons, CO, US· patent location history
1998–2011Patents assigned to SEMITOOL INC (58)· patent assignee history
1998–2021Based in Kalispell, MT, US· patent location history
2011–2021Patents assigned to APPLIED MATERIALS INC (16)· patent assignee history
2011–2016Patents assigned to WOODRUFF DANIEL J (8)· patent assignee history
2012–2013Patents assigned to HANSON KYLE M (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEMITOOL INC581998–2011
APPLIED MATERIALS INC162011–2021
WOODRUFF DANIEL Jself82011–2016
EXABYTE CORP71996–1999
HANSON KYLE M22012–2013
Locations
LocationPatentsSpan
Kalispell, MT, US771998–2021
Lyons, CO, US51996–1999
Colorado Springs, CO, US21992–1994