Inventor

Jacobus Burghoorn

Inventor

Haelen, NL

Overview

17→

Patents

2003–2014

Patent span

Physics

Primary field (CPC G)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices71%

G03BApparatus or arrangements for taking photographs or for projecting or viewing them13%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%

PatentTitleYear

8,675,175'Lithographic apparatus and device manufacturing method'2014 8,395,755'Lithographic apparatus and device manufacturing method'2013 8,264,664'Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method'2012 8,139,217'Alignment systems and methods for lithographic systems'2012 7,879,682'Marker structure and method for controlling alignment of layers of a multi-layered substrate'2011 7,880,880'Alignment systems and methods for lithographic systems'2011 7,834,975'Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly'2010 7,629,697'Marker structure and method for controlling alignment of layers of a multi-layered substrate'2009 7,576,834'Lithographic apparatus and device manufacturing method'2009 7,518,706'Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly'2009 7,476,490'Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method'2009 7,439,531'Alignment systems and methods for lithographic systems'2008 7,332,732'Alignment systems and methods for lithographic systems'2008 7,329,888'Alignment systems and methods for lithographic systems'2008 7,297,971'Alignment systems and methods for lithographic systems'2007 6,876,436'Interferometric alignment system for use in vacuum-based lithographic apparatus'2005 6,507,388'Interferometric alignment system for use in vacuum-based lithographic apparatus'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2014Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history

2003–2014Based in Haelen, NL· patent location history

2012–2013Patents assigned to BURGHOORN JACOBUS (3)· patent assignee history

2012Patents assigned to VAN HAREN RICHARD JOHANNES FRANCISCUS (2)· patent assignee history

2012Patents assigned to DUNBAR ALLAN REUBEN (1)· patent assignee history

2013Patents assigned to DE JAGER PIETER WILLEM HERMAN (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	17	2003–2014
BURGHOORN JACOBUSself	3	2012–2013
VAN HAREN RICHARD JOHANNES FRANCISCUS	2	2012
DE JAGER PIETER WILLEM HERMAN	1	2013
DUNBAR ALLAN REUBEN	1	2012

Locations

Location	Patents	Span
Haelen, NL	17	2003–2014